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Laser Chemical Etching of Conducting and Semiconducting Materials

  • T. J. Chuang (a1)

Abstract

The purpose of the paper is to examine the basic processes involved in the laser-enhanced chemical etching of solids. Specifically, the process of chemisorption, the reaction between the adsorbate and substrate atoms and the vaporization of product species affected by the laser radiation are discussed. It is shown that the laser method can provide important insight into the gas-surface reaction mechanisms. In addition, a number of examples are given to demonstrate the potential of the technique for applications to material processing. Some current studies on the laser-induced chemical etching of materials relevant to microelectronics are reviewed. Certain practical experimental approaches are also considered.

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