Skip to main content Accessibility help
×
Home

Large-Area Pulsed Laser Deposition of Silicon Carbide Films

  • D. Yang (a1), L. Xue (a1), C. M. Mccague (a2), P. R. Norton (a2) and C. S. Zhang (a2)...

Abstract

Silicon carbide (SiC) thin films are attractive for a wide range of applications ranging from microelectronic and opto-electronic devices to protective and tribological coatings. In this paper, we will demonstrate that silicon carbide films can be successfully deposited by pulsed laser deposition (PLD) technique over large areas, with good uniformity in thickness, composition, and film-specific properties.

Amorphous SiC films were grown on silicon wafers of 75-mm diameter over a temperature range of 25 – 650°C using a KrF excimer laser at a wavelength 248 nm and a repetition rate of 100 Hz. The large-area uniform coverage was obtained by rastering the laser beam over the radius of a rotating SiC target of 90-mm diameter, while the substrate was rotated simultaneously. The uniformity of film composition over the 75-mm wafers was characterized by Auger electron spectroscopy (AES), while the crystallinity of films was investigated by X-ray diffraction (XRD). The morphology of the films was evaluated using scanning electron microscopy (SEM) and atomic force microscopy (AFM). The thickness of the coatings, and the index of refraction, n, along the wafer radii were measured optically using a spectrophotometer.

Copyright

References

Hide All
1- Tang, Y., Wang, Y., Tang, H., Li, K. and Shi, J., Material Research Bulletin, 32(9), 1229(1997).
2- Brown, D. M., Downey, E., Grezzo, M., Kretchmer, J., Krishnamrthy, V., Hennessy, W., Michon, G., Solid State Electronics 59, 1531(1996).
3- dreike, P. L., Fleetwood, D.M., King, D.B., Sprauer, D.C., Zipperian, T.E., IEET Trans. Compon., Packag., Manuf. Technol., 17(A), 594(1994).
4- Christidis, T., Tabbal, M., Isber, S., Khakani, M. A. El, Chaker, M., Applied Surface Science 184, 268(2001).
5- Loboda, M. J. and Ferber, M. K., J. Mater. Res. 8, 2908(1993).10.1557/JMR.1993.2908
6- El, M. A. Khakani, Chaker, M., O'Hern, M. E. and Oliver, W. C., J. Appl. Phys. 82(9), 4310(1997).
7- Botton, G. (Private communication).
8- Mehregany, M., Zorman, C. A., Roy, S., Fleischman, A. J., Wu, C.H. and Rajan, N., International Materials Reviews 45(3), 85(2000).
9- Wahab, Q., Hultman, L., Ivanov, I. P., Willander, M., and Sundern, J.E., J. Mater. Res. 10, 1349(1995).
10- Schmit, J., Troffer, T., Christiansen, K., Christiansen, S., Helbig, R., Pensl, G. and Strunk, H. P., Mater. Sci. Forum 264-268, 247(1998).
11- Reitano, R. and Baeri, P., Europhysics Letters 43(5), 565(1998).
12- EI Khakani, M. A., Chaker, M., O'Hern, M. E. and Oliver, W. C., J. Appl. Phys. 82(9), 4310(1997).10.1063/1.366249
13- Rimai, L., Ager, R., Hangas, J., Logothetis, E. M., Abu-Ageel, N. and Aslam, M., J. Appl. Phys. 73, 8242 (1993).10.1063/1.353442
14- Stan, M. A., Patton, M. O., Warner, J. D., Yang, J. W. and Pirouz, P., Appl. Phys. Lett. 64, 2667(1994).
15- Pelt, J. S., Ramsey, Matthew E. and Durbin, S. M., Thin Solid Films 371, 72(2000).
16- Rimai, L., Ager, R., Weber, W. H., Hangas, J., Samman, A. and Zhu, W., J. Appl. Phys. 77, 6601(1995).
17- Boughaba, S., Sproule, G. I., McCaffrey, J. P., Islam, M. and Graham, M. J., Thin Soild Films 358, 104(2000).
18- Chen, L.C., in Pulsed Laser Deposition, edited by Chrisey, D. B. and Hubler, G. K. (John Wiley, New York, 1994), p. 167.
19- Kelliher, J. T., Massuda, M., DiFonzo, P. A. and Neal, T. R., Mat. Res. Soc. Symp. Proc. 495, 159(1998).

Related content

Powered by UNSILO

Large-Area Pulsed Laser Deposition of Silicon Carbide Films

  • D. Yang (a1), L. Xue (a1), C. M. Mccague (a2), P. R. Norton (a2) and C. S. Zhang (a2)...

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed.