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Large Area Uniform Deposition of YBa2Cu3O7 Thin Films by a 90° Off-axis Sputtering Technique

Published online by Cambridge University Press:  15 February 2011

R. A. Rao ,
Q. Gan  and
C. B. Eom
R. A. Rao
Affiliation:
Department of Mechanical Eng. and Materials Science, Duke University, Durham, NC 27708
Q. Gan
Affiliation:
Department of Mechanical Eng. and Materials Science, Duke University, Durham, NC 27708
C. B. Eom
Affiliation:
Department of Mechanical Eng. and Materials Science, Duke University, Durham, NC 27708
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Abstract

Large area uniform deposition of Yba2Cu3O7 (YBCO) thin films on 8 inch diameter wafers, using a 3 inch diameter sputtering target and optimized substrate rotation in a single target 90° off-axis sputtering technique, is reported. The variation in thickness, composition and superconducting properties was studied as a function of substrate position on stationary and rotating substrates. The films deposited from a 3” target on rotating substrates displayed uniform thickness (< ±5% variation) and composition (< 2.3% deviation from target stoichiometry) and a consistently high transition temperature ( Tc > 88.3°K) over an 8” diameter area.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 401: Symposium G – Epitaxial Oxide Thin Films II , 1995 , 423
Copyright
Copyright © Materials Research Society 1996

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