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KrF Laser-Induced Chemical Etching of Nickel with Br2

  • George W. Tyndall (a1) and Christopher R. Moylan (a1)

Abstract

A quartz crystal microbalance (QCM) has been used to study the 248 nm laser-induced etching of nickel by Br2. The experiment consists of focusing a pulsed UV laser beam at normal incidence onto the surface of a quartz crystal coated with 1μm of polycrystalline nickel. Absolute etch rates of nickel, in terms of mass removed per unit time, are determined from the integrated sensitivity function of the 6Mhz crystals used in this work. The dependence of the etch rate on Br2 pressure and laser fluence was measured. The kinetic data obtained from these measurements show that the mechanism of the etching process is dominated by the formation and the subsequent removal of a NixBry monolayer.

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KrF Laser-Induced Chemical Etching of Nickel with Br2

  • George W. Tyndall (a1) and Christopher R. Moylan (a1)

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