Skip to main content Accessibility help

Ir Laser-Induced Deposition of Silicon Thin Films

  • T. R. Gattuso (a1), M. Meunier (a1), D. Adler (a1) and J. S. Haggerty (a1)


The deposition of a-Si:H by means of CO2 laser-induced pyrolysis of silane gas is described. Deposition rates were found to increase with increasing silane flow rate, reactor pressure, laser power and substrate temperature. Spin density decreased and both optical gap, and hydrogen content increased with decreasing substrate temperature. Electrical conductivities are reported.



Hide All
1. Knights, J. C. and Lucovsky, G., CRC Critical Reviews in Solid State and Materials Science, 9, 211–83 (1980).
2. Carlson, D. E., Sol. En. Mat., 3, 503–18 (1980);
2a Hamokawa, Y., J. de Physique, C4, 1131–42 (1981).
3. Fritzche, H., Sol. En. Mat., 3, 447–501 (1980).
4. Paul, W. and Anderson, D., Sol. En. Mat., 5, 229–316 (1981).
5. Hirose, M., J. de Physique, C4, 705–14 (1981).
6. Christensen, C. P. and Lakin, K. M., Appl. Phys. Lett., 32, 254–5 (1978).
7. Baranauskas, V., Mammana, C. I. Z., Klinger, R. E. and Greene, J. E., Appl. Phys. Lett., 36, 930–2 (1980).
8. Allen, S. D., J. Appl. Phys., 52, 6501–5 (1981).
9. Bilenchi, R. and Musci, M., Proc. 8th Int. Conf. in Chemical Vapor Depositon Electrochemical Society, 275–83 (1981).
9a Bilenchi, R., Gianinoni, I. and Musci, M., J. Appl. Phys., 33, 6479 (1982).
10. Deutsch, T. F., Ehrlich, D. J. and Osgood, R. M. Jr., Appl. Phys. Lett., 35, 175–7 (1979).
11. Johns, J. W. C. and Kreiner, W. A., J. Mol. Spec., 60, 400–11 (1976).
12. Mitchell, A. C. G. and Zemansky, M. W., Resonance Radiation and Excited Atoms, Cambridge University Press, Cambridge (1961).
13. Okabe, H., Photochemistry of Small Molecules, Wiley, New York (1978).
14. Marra, R. A. and Haggerty, J. S., Ceramic Engineering and Science Proceedings, 3, 12, (1981).
15. Gattuso, T. R., Meunier, M., and Haggerty, J. S., “Laser Induced Deposition of Thin Films, MIT–EL82–022, May 1982.
16. Deutsch, T. F., J. Chem. Phys., 70, 1187–92 (1979).
17. Scott, B. A., Plecenik, R. M. and Simonyi, E. E., Appl. Phys. Lett., 39, 73–5 (1981).
18. Sladek, K. H., J. Electrochem. Soc.: Sol. St. Sci., 118, 654–7 (1971).
19. Booth, D. C., Allred, D. D. and Seraphin, B. O., Sol. En. Mat., 2, (1979).
20. Hilman, J. T., B. S. Thesis, M.I.T., June 1982.
21. Bloem, J. and Giling, L. J., Current Topics in Materials Science, ed. E. Kaldis, 1, 147–342 (1978).
22. Friedlander, S. K., Smoke, Dust and Haze, Wiley, New York (1977).
23. Adler, D., J. de Physique, C4, 14 (1981).
24. Hasegawa, S. et al. , Phil. Mag. B, 43, 149–56 (1981).
25. Tauc., J., Optical Properties of Solids, ed. Abeles, F., North-Holland, Amsterdam (1970) pp. 227313.
26. Cody, C. D. et al. , Solar Cells, 2, 227–43 (1980).
27. Janai, M., and Karlsson, B., Sol. En. Mat., 1, 387–95 (1979).
28. Mott, N. F., and Davis, E. A., Electronic Processes in Non-Crystalline Materials, 2nd Ed., Clarendon Press (1979).

Ir Laser-Induced Deposition of Silicon Thin Films

  • T. R. Gattuso (a1), M. Meunier (a1), D. Adler (a1) and J. S. Haggerty (a1)


Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed