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Ion Mixing Kinetics of Thin Layered Films in the Fe-Al System

  • J. Grilhe (a1), J.P. Riviere (a1), J. Delafond (a1) and C. Jaouen (a1)

Abstract

Evaporated bilayers and multilayers of Fe and Al have been studied during ion beam mixing with Xe ions using in-situ electrical resistivity measurements. Experiments have been performed in the composition range 40 – 58 at.% Al and at both temperatures 77 K and 300 K. A semi-empirical model is proposed to explain the observed kinetics. At low doses, a square root dependence of the mixed volume fraction on dose is found at 77 K but not at 300 K. The results are discussed by comparison with the different models proposed for ion beam mixing.

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