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Ion Emission During Low Fluence KrF Laser-Metal Interaction

Published online by Cambridge University Press:  28 February 2011

Q. Y. Ying
Affiliation:
State University of New York at Buffalo, Department of Electrical and Computer Engineering, Amherst, New York 14260
H. S. Kwok
Affiliation:
State University of New York at Buffalo, Department of Electrical and Computer Engineering, Amherst, New York 14260
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Abstract

A KrF laser was used to produce ions from an aluminum surface. The threshold energy fluence was found to be ∼30 mJ/cm2 which was lower than similar studies on the ablation of metals. The measured threshold however, was of the same order of magnitude for atomic desorption from semiconductor surfaces. This process can be used to perform surface analysis without ablation damage.

Type
Articles
Copyright
Copyright © Materials Research Society 1987

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