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Ion Effects in Optical Films

Published online by Cambridge University Press:  16 February 2011

U. J. Gibson
U. J. Gibson*
Affiliation:
Thayer School of Engineering, Dartmouth College, Hanover NH 03755
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Abstract

Ion bombardment during growth of thin films has been shown to be a powerful technique for alteration of a wide variety of film properties from index of refraction and stoichiometry to density and abrasion resistance. A brief review of the deposition processes and ion effects of relevance to the production of optical films is presented. Application of the technique to some particular problems in films with both optical and protective roles, and the use of ion beams to alter the chemical composition and hence index of films will be discussed. Both homogeneous and spatially non-uniform coatings will be discussed, including generation of multilayer filters and gradient index structures in waveguiding films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 223: Symposium E – Low Energy Ion Beam and Plasma Modification of Materials , 1991 , 263
Copyright
Copyright © Materials Research Society 1991

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References

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