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Ion Beam Processing of Optical Materials

  • F. L. Williams (a1), L. L. Boyer (a1), D W. Reicher (a1), J. J. McNally (a1), G. A. Al-Jumaily (a1) and J. R. McNeil (a1)...

Abstract

We have deposited thin films of optical materials using ion beam sputtering and ion assisted deposition techniques. It is possible to obtain good quality film material deposited on substrates at temperatures lower than normally required. Ion assisted deposition influences film stoichiometry and packing density, which in turn determine optical and mechanical properties of the film material. We discuss two general indicators which appear helpful in predicting the degree to which these occur.

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1. Herrmann, W. C. Jr., and McNeil, J. R., “Ion Beam Applications for Optical Coating,” Optical Thin Films, Proc. SPIE, 325, 101 (1982).
2. Harper, J. M. E., Cuomo, J. J., and Kaufman, H. R., “Technology and Applications of Broad-Beam Ion Sources Used in Sputtering. Part II. Applications,” J. Vac. Sci. Technol. 21, 737 (1982).
3. Hirsch, E. H., and Varga, I. K., “Thin Film Annealing by Ion Bombardment,” Thin Solid Films, 69, 99 (1980).
4. Martin, P. J., MacLeod, H. A., Netterfield, R. P., Pacey, G. C., and Sainty, W. G., “Ion Beam-Assisted Deposition of Thin Films,” Appl. Opt. 22, 178 (1983).
5. Williams, F. L., Reicher, D. W., Juang, C.-B., and McNeil, J. R., “Metal Oxides Deposited Using Ion Assisted Deposition at Low Temperature,” J. Vac. Sci. Technol. A7, in press (1989).
6. Sites, J. R., Gilstrap, P., and Rujkorakarn, R., “Ion Beam Sputter Deposition of Optical Coatings,” Opt. Eng. 22, 447, (1983).
7. Harper, J. M. E., Cuomo, J. J., and Hentzell, H. T. G., “Quantitative Ion Beam Process for the Deposition of Compound Thin Films,” Appl. Phys. Lett., 43, 547 (1983).
8. Ogura, S., and Macleod, H. A., “Water Sorption Phenomena in Optical Thin Films,” Thin Solid Films, 34, 371 (1976).
9. McNally, J. J., Al-Jumaily, G. A., McNeil, J. R., and Bendow, B., “Ion Assisted Deposition of Optical and Protective Coatings for Heavy Metal Fluoride Glass,” Appl. Opt., 25, 1973 (1986).
10. Hurley, R. E., and Williams, E. W., “Ion Plating on Plastic Substrates,” Thin Solid Films, 92, 99 (1982).
11. Tran, D. C., Sigel, G. H. Jr., and Bendow, B., “Heavy Metal Fluoride Glasses and Fibers, A Review,” J. Lightwave Technol., 2, 566 (1984).
12. McNally, J. J., Jungling, K. C., Williams, F. L., and McNeil, J. R., “Optical Coatings Deposited Using Ion Assisted Deposition,” J. Vac. Sci. Technol., A5, 2145 (1987).
13. Kaufman, H. R., Cuomo, J. J., and Harper, J. M. E., “Technology and Applications of Broad-Beam Ion Sources Used in Sputtering. Part 1. Ion Source Technology,” J. Vac. Sci. Technol., 21, 725 (1982).
14. Manafacier, J. C., Gasiot, J., and Fillard, J. P., “A Simple Method for the Determination of the Optical Constants n, k and the Thickness of a Weakly Absorbing Thin Film,” J. Phys. E. Sci. Instru., 9, 1002 (1976).
15. Herrmann, W. C. Jr., “E-Beam Deposition Characteristics of Reactively Evaporated Ta2O5 for Optical Interference Coatings,” J. Vac. Sci. Technol., 18, 1303 (1981).
16. Demiryont, H., Sites, J. R. and Geib, K., “Effects of Oxygen Content on the Optical Properties of Tantalum Oxide Films Deposited by Ion-Beam Sputtering,” Appl. Opt. 24, 490 (1985).
17. Behrisch, R., and Scherzer, B. M. U., “Rutherford Backscattering as a Tool to Determine Electronic Stopping Powers in Solids,” Thin Solid Films, 19, 247 (1973).
18. Hofmann, S., and Sanz, J. M., “Quantitative XPS Analysis of the Surface Layer of Anodic Oxides Obtained During Depth Profiling by Sputtering with 3 keV Ar+ Ions,” J. Trace Micropobe Tech., 1, 213 (19821983).
19. Malherbe, J. B., Hofmann, S., and Sanz, J. M., “Preferential Sputtering of Oxides: A Comparison of Model Predictions with Experimental Data,” Appl. Surf. Sci., 27, 355 (1986).
20. Netterfield, R. P., Mueller, K. -H., McKenzie, D. R., Goonan, M. J., and Martin, P. J., “Growth Dynamics of Aluminum Nitride and Aluminum Oxide Thin- Films Synthesized by Ion-Assisted Deposition,” J. Appl. Phys., 63, 760 (1988).
21. Mueller, K. -H., “Model for Ion Assisted Thin-Film Densification,” J. Appl. Phys., 59, 2803 (1986).
22. Mueller, K. -H., “Ion-Beam-Induced Epitaxial Vapor-Phase Growth: A Molecular-Dynamics Study,” Phys. Rev., B35, 7906 (1987).
23. Sigmund, P., “Theory of Sputtering, I. Sputtering Yield of Amorphous and Polycrystalline Targets,” Phys. Rev., 184, 383 (1969).
24. Williams, F. L., Jacobson, R. D., McNeil, J. R., Exarhos, G. J. and McNally, J. J., “Optical Characteristics of Thin Films Deposited at Low Temperature Using Ion Assisted Deposition,” J. Vac. Sci. Technol., A 6, 2020 (1988).
25. Carter, G., Armour, D. G., Donnelly, S. E., and Webb, R. P., “The Injection of Gas Ions into Solids: Their Trapping and Escape,” Rad. Eff., 53, 143 (1980).
26. Andersen, H. H., and Sigmund, P., “Defect Distributions in Channeling Experiments,” Nucl. Instru. Meth., 38, 238 (1965).
27. Higashino, H., Kawaguchi, T., Adachi, H., Makino, T., and Yamazaki, O., “High Speed Optical TIR Switches Using PLZT Thin-Film Waveguides on Sapphire,” Proc. of the 6th Intl. Meeting on Ferroelec., Kobe 1985, Jap. J. Appl. Phys., 24, supplement 24–2, 284 (1985).
28. Adachi, H., Mitsuyu, T.,Yamazaki, O., and Wasa, K., “Bragg A-O Deflector Using A Piezoelectric PLZT Thin Film,” Proc. of the 6th Intl. Meeting on Ferroelect., Kobe 1985, Jap. J. Appl. Phys., 24, supplement 24–3, 287 (1985).
29. Mukherjee, A., Brueck, S. R. J., and Wu, A. Y., “Electric Field Induced Second Harmonic Generation in PLZT,” to be published, (1989).

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