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Ion Beam Induced Growth Structure of Fluorite Type Oxide Films for Biaxially Textured htsc Coated Conductors

Published online by Cambridge University Press:  15 March 2011

Y. Iijima ,
M. Kimura  and
T. Saitoh
Y. Iijima
Affiliation:
Fujikura Ltd., 1-5-1, Kiba, Koto-ku, Tokyo 135-8512, JAPAN, ijm@rd.fujikura.co.jp
M. Kimura
Affiliation:
Fujikura Ltd., 1-5-1, Kiba, Koto-ku, Tokyo 135-8512, JAPAN
T. Saitoh
Affiliation:
Fujikura Ltd., 1-5-1, Kiba, Koto-ku, Tokyo 135-8512, JAPAN
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Abstract

Biaxially aligned film growth by dual-ion-beam sputtering method were studied for fluorite type (Zr0.85Y0.15O1.93(YSZ), Hf0.74Yb0.26O1.87, CeO2), pyrochlore type (Zr2Sm2O7), and rare-earth C type (Y2O3, Sm2O3) oxides on polycrystalline Ni-based alloy substrates. Cube-textured (all axes aligned with a <100> axis substrate normal) films were obtained for fluorite and pyrochlore ones by low energy (<300 eV) ion bombardment at low temperatures (< 300 °C). Besides, cube textured Y2O3 films were obtained in far narrow conditions with a quite low energy (150 eV)-ion bombardment at the temperature of 300°C. The assisting ion energy dependence was discussed in connection with lattice energies for these oxide crystals.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 587: Symposium O – Substrate Engineering - Paving the Way to Epitaxy , 1999 , O2.3
Copyright
Copyright © Materials Research Society 2000

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