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Investigation of CVD β-SiC Surfaces Produced VIA a “Novel” Surface Replication Process

  • Aliki K. Collins (a1), Joseph T. Keeley (a1), Michael A. Pickering (a1) and Raymond L. Taylor (a1)

Abstract

A novel replication process for silicon carbide surfaces has been developed. A polished polycrystalline chemical vapor deposited (CVD) β-SiC surface was reproduced from a SiC substrate (mandrel) by a two-step pretreatment process followed by CVD of SiC. In this paper we describe the process and present characterization data for both the substrate and the replicated surfaces. Based on the characterization results, we have developed a model which describes the chemical reactions that occur during the replication process.

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5. Collins, A. K., Keeley, J. T., Pickering, M.A., and Taylor, R.L., to be published.
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Investigation of CVD β-SiC Surfaces Produced VIA a “Novel” Surface Replication Process

  • Aliki K. Collins (a1), Joseph T. Keeley (a1), Michael A. Pickering (a1) and Raymond L. Taylor (a1)

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