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Investigation of Characteristics of Multi-Function ZnO Thin Film Deposited with Various Argon and Oxygen Ratios

Published online by Cambridge University Press:  31 January 2011

Jong-Shin Wu ,
Che-Wei Hsu ,
Tsung-Chieh Cheng ,
Chun-Hui Yang ,
Yi-Ling Shen ,
Sheng-Yao Wu  and
Wen-Hsien Huang
Jong-Shin Wu
Affiliation:
chongsin@faculty.nctu.edu.tw, National Chiao Tung University, Department of Mechanical Engineering, Hsinchu, Taiwan, Province of China
Che-Wei Hsu
Affiliation:
chewei.me93g@nctu.edu.tw, National Chiao Tung University, Department of Mechanical Engineering, Hsinchu, Taiwan, Province of China
Tsung-Chieh Cheng
Affiliation:
tcchengme@cc.kuas.edu.tw, National Kaoshiung University of Applied Science, Department of Mechanical Engineering, Kaohsiung, Taiwan, Province of China
Chun-Hui Yang
Affiliation:
ivyyang@ndl.org.tw, National Nano Device Laboratories, Hsinchu, Taiwan, Province of China
Yi-Ling Shen
Affiliation:
ylshen@ndl.org.tw, National Nano Device Laboratories, Hsinchu, Taiwan, Province of China
Sheng-Yao Wu
Affiliation:
chongsin@faculty.nctu.edu.tw, National Chiao Tung University, Department of Mechanical Engineering, Hsinchu, Taiwan, Province of China
Wen-Hsien Huang
Affiliation:
1096303160@cc.kuas.edu.tw, National Kaoshiung University of Applied Science, Department of Mechanical Engineering, Kaohsiung, Taiwan, Province of China
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Abstract

The ZnO thin film was successfully deposited on a glass substrate at RT by a RF reactive magnetron sputtering method. Structural, chemical, optical, and hydrophilic/hydrophobic properties are measured by using a surface profilometer, an x-ray diffractometry (XRD), an x-ray photoelectron spectroscopy (XPS), a UV-VIS spectrophotometer, and a contact angle system, respectively. Results show that the deposition rate decreases with increasing O2/(Ar+O2) ratio. Otherwise, the best stoichiometric and quality of ZnO thin film was observed at 0.30 of O2/(Ar+O2) ratio by the smallest FWHM and the strong O-Zn bonds. Regardless of O2/(Ar+O2) ratio effect or thickness effect, high transmittance (> 86%) in the visible region is observed, while the UV-shielding characteristics depend upon both the magnitude of film thickness. The film thickness plays a more prominent role in controlling optical properties, especially in the UV-shielding characteristics, than the O2/(Ar+O2) ratio. However, the hydrophobic characteristics can be obtained when the glass coating with ZnO thin films. In general, with properly coated ZnO thin film, we can obtain a glass substrate which is highly transparent in the visible region, has good UV-shielding characteristics, and possesses highly hydrophobic characteristics (self-clean capability), which is highly suitable for applications in the glass industries.

Keywords

sputteringthin filmx-ray photoelectron spectroscopy (XPS)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1174: Symposium V – Functional Metal-Oxide Nanostructures , 2009 , 1174-V09-05
Copyright
Copyright © Materials Research Society 2009

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