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Investigation into the Thin-Film Fabrication of Intermetallic NiTi

Published online by Cambridge University Press:  21 February 2011

A. Peter Jardine ,
Hong Zhang  and
Lysa D. Wasielesky
A. Peter Jardine
Affiliation:
Dept. of Materials Science and Engineering, S.U.N.Y. at Stony Brook, Stony Brook, NY 11793
Hong Zhang
Affiliation:
Dept. of Materials Science and Engineering, S.U.N.Y. at Stony Brook, Stony Brook, NY 11793
Lysa D. Wasielesky
Affiliation:
Dept. of Materials Science and Engineering, S.U.N.Y. at Stony Brook, Stony Brook, NY 11793
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Abstract

Thin-films of Ni and Ti were formed by sputter co-deposition of Ni and Ti onto amorphous SiO2 and single crystal NaCl and Sapphire substrates. Films were characterized as follows: a) The chemical composition of the films was analysed by EDAX b) The gross morphology was examined by Scanning Electron Microscopy. c) The crystal phases were indentified by X-ray diffraction and Electron diffraction. Intermetallic NiTi has been identified in samples annealed in vacuo at 850°C. Annealing at 500°C in vacuum produced chemical separation of the Ni and Ti. This effect may be due to a narrow solidus region for the existence of NiTi and inhomogeneities due to uneven deposition of the Ni and Ti.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 187: Symposium J – Thin Film Structures and Phase Stability , 1990 , 181
Copyright
Copyright © Materials Research Society 1990

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References

[1] Rondelli, G., Vincenti, B. and Cigada, A. in Shape Memory Materials, edited by Doyama, M., Somiya, S. and Chang, R.P.H. (Mat.Res.Soc. Int. Meeting on Advanced Materials,2 Pittsburgh PA 1989) pp. 237 Google Scholar
[2] Suzuki, Y. in Shape Memory Materials, edited by Doyama, M., Somiya, S. and Chang, R.P.H. (Mat.Res.Soc. Int. Meeting on Advanced Materials,9 Pittsburgh PA 1989) pp.557 Google Scholar
[3] Morris, D.G. and Morris, M.A., Mat.Sci. and Eng., (in press)Google Scholar
[4] Clemens, B.M., J. Appl. Phys., 61, 4525 (1987)Google Scholar
[5] Rai, A.K. and Bhattachyra, R.S., Mat. Sci and Eng., 85, 139 (1987)Google Scholar
[6] Purdy, G.R. and Parr, J.G., Trans. AIME, 21, 636 (1961)Google Scholar
[7] Nishida, M., Wayman, C.M. and Honma, T., Metall. Trans.. A., 17A, 1505 (1986)Google Scholar
[8] Wang, F.E., Beuhler, W.J. and Pickhart, S.J., J.Appl. PHys., 36, 3232 (1965)Google Scholar
[9] Michal, G.M. and Sinclair, R., Acta. Cryst., B 37, 1803 (1981)Google Scholar
[10] Jardine, A.P., Bassett, M. and Ashbee, K.H.G., J. Mater.Sci., 23, 4273 (1988)Google Scholar