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Interface Conduction between Conductive ReO3 Thin Film and NdBa2Cu3O6 Thin Film

  • Manabu Ohkubo (a1), Kumiko Fukai (a1), Kohji Matsuo (a1), Nobuyuki Iwata (a1) and Hiroshi Yamamoto (a1)...

Abstract

The Re oxide films were deposited on quartz glasses by RF reactive sputtering from a Re metal target. The lowest resistivity was observed in the film in-situ annealed at 200°C in Ar atmosphere and showed the order of 10-4 Ω cm of which the value was still about 10 times as large as that of a single crystal ReO3. The temperature dependence of the resistivity revealed a metallic behavior. A superconductivity did not take place in the bilayered film of ReO3 / NdBa2Cu3O6. In the interface region the resistivity minimum probably caused by the Kondo effect was observed in the neighborhood of 120K.

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References

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1. Feinleib, J., Scouler, W. J., Ferretti, A., Physical Review, 165, 765(1968).
2. Pearsall, T. P. and Lee, C. A., Physical Review B, 10, 2190(1974).
3. Kondo, J., Prog. Theor. Phys., 32, 37(1964).

Interface Conduction between Conductive ReO3 Thin Film and NdBa2Cu3O6 Thin Film

  • Manabu Ohkubo (a1), Kumiko Fukai (a1), Kohji Matsuo (a1), Nobuyuki Iwata (a1) and Hiroshi Yamamoto (a1)...

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