Skip to main content Accessibility help

Interconnect-Related Degradation of PZT Capacitor for FeRAM

  • S. Kobayashi (a1), K. Amanuma (a2) and H. Hada (a2)


Ferroelectric properties of a Pb(Zr,Ti)O3 (PZT) thin film capacitor with a conventional Al/TiN/Ti interconnect are seriously degraded by annealing at around 400°C. The degradation of the PZT capacitor is reduced as the interconnects are narrowed while the total area of the interconnects on the capacitor is fixed. This result cannot be understood by supposing that Ti diffusion into PZT degrades the ferroelectric properties. A possible cause for the degradation is stress placed on the PZT film during the 400°C annealing.



Hide All
1. Jung, D.J., Kang, N.S., Lee, S.Y., Koo, B.J., Lee, J.W., Park, J.H., Chun, Y.S., Lee, M.H., Jeon, B.G., Lee, S.I., Shim, T.E., and Hwang, C.G., in Dig. of Tech. Papers of Symposium on VLSI Tech., 1997, pp.139140.
2. Yamazaki, T., Inoue, K., Miyazawa, H., Nakamura, M., Sashida, N., Satomi, R., Kerry, A., Katoh, Y., Noshiro, H., Takai, K., Shinohara, R., Ohno, C., Nakajima, T., Furumura, Y., and Kawamura, S., in IEDMTech.Dig., 1997, pp.613616.
3. Hwang, Y.S., Lee, J.W., Lee, S.Y., Koo, B.J., Jung, D.J., Chun, Y.S., Lee, M.H., Shin, D.W., Shin, S.H., Lee, S.E., Kim, B.H., Kang, N.S., and Kim, K.N., in Extended Abstracts of the 1997 International Conference on Solid State Devices and Materials, 1997, pp. 3031.
4. Kobayashi, S., Amanuma, K., and Hada, H., Electron Device Letters, 19,417 (1998).
5. Amanuma, K., Mori, T., Hase, T., Sakuma, T., Ochi, A., and Miyasaka, Y., Jpn.J.Appl.Phys., 32, 4150 (1993).
6. Sreenivas, K., Reaney, I., Maeder, T., Setter, N., Jagadish, C., and Elliman, R.G., J.Appl.Phys., 75, 232(1994).
7. Mihara, T., Watanabe, H., and Araujo, C.A.P., Jpn.J.Appl.Phys., 33, p.3996 (1994).
8. Spierings, G.A.C.M., Dormans, G.J.M., Moors, W.G.J., Ulenaers, M.J.E., and Larsen, P.K., J.Appl.Phys., 78, 1926 (1995).
9. RLide, D., Frederikse, H.P.R., in Handbook of Chemistry and Physics (CRC, New York, 1996-1997) pp.1232 to 12.
10. Cook, W.R. Jr, Berlincourt, D.A., and Scholz, F.J., J.Appl.Phys., 34, 1392 (1963).
11. Thomton, J.A. and Hoffman, D.W., Thin Solid Films, 171, 5 (1989).
12. Garino, T.J. and Harrington, M., in Mat. Res. Soc. Symp. Proc. Vol.243, 1992, pp.341347
13. Yuki, Y., etc., in Mechanics of Interface (Baifukan, Tokyo, 1993) pp.6568.


Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed