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In-Situ High Resolution Transmission Electron Microscopy of Dynamic Events During the Amorphous to Crystalline Phase Transformation in Silicon

Published online by Cambridge University Press:  25 February 2011

M. A. Parker
Affiliation:
Materials Science Dept., Stanford University, Stanford, CA 94305 Materials and Process Engineering Dept., IBM, Rochester, MN 55901
T. W. Sigmon
Affiliation:
Electrical Engineering Department, Stanford University, Stanford, CA 94305
R. Sinclair
Affiliation:
Materials Science Dept., Stanford University, Stanford, CA 94305
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Abstract

A technique has been developed which employs high resolution transmission electron microscopy (HRTEM) for the observation of the atomic mechanisms associated with solid state phase transformation as they occur at elevated temperatures. It consists of the annealing in-situ of cross-section transmission electron microscopy (TEM) specimens that have been favorably oriented for lattice fringe imaging and the video-recording of dynamic events as they occur in real-time. By means of this technique, we report the first video-recorded lattice images of crystallographic defect motion in silicon, viz. the motion of dislocations and stacking faults, as well as the first such images of the atomic mechanisms responsible for the amorphous to crystalline (a-c) phase transformation, viz. heterogeneous nucleation of crystal nuclei, coalescence of crystal nuclei by co-operative atomic processes, ledge motion at the growth interface, and normal growth in silicon. This technique holds great potential for the elucidation of the atomic mechanisms involved in reaction kinetics in the solid state.

Type
Articles
Copyright
Copyright © Materials Research Society 1986

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References

1. Hashimoto, H. et al., Jap. J. Appl. Phys., 19, 11 (1980).Google Scholar
2. Sinclair, R. and Yamashita, T., Mat. Res. Soc. Symp. Proc., 14, 295 (1983).Google Scholar
3. Yamashita, T. and Sinclair, R., Elec. Microsc. Soc. Amer. Procs., 41, 112 (1983).Google Scholar
4. Sinclair, R. et al., Nature, 298, 127 (1982).Google Scholar
5. Sinclair, R., Yamashita, T. and Ponce, F. A., Nature, 290, 386 (1981).Google Scholar
6. Symposium on Atomic Motion Studies by TEM, ASU, Tempe, AZ (1986).Google Scholar
7. Parker, M. A. and Sinclair, R., Elec. Microsc. Soc. Amer. Procs., 43, 358 (1985).CrossRefGoogle Scholar
8. Gibbons, J. F. and Sigmon, T. W., Laser Annealing of Semiconductors, Poate, J. M. and Mayer, J. W. (Academic Press, New York, 1982), pg. 325. Google Scholar
9. Parker, M. A., Sigmon, T. W. and Sinclair, R., Appl. Phys. Lett., 47, 626, (1985).Google Scholar
10. Spaepen, F. and Turnbull, D., Laser Annealing of Semiconductors, eds. Poate, J. M. and Mayer, J. W. (Academic Press, New York, 1982), Pg. 15.Google Scholar
11. Lietoila, A., Wakita, A., Sigmon, T. W. and Gibbons, J. F., J. Appl. Phys., 53, 4399 (1982).Google Scholar
12. Parker, M. A., Sigmon, T. W. and Sinclair, R., Appl. Phys. Lett. (submitted).Google Scholar
13. Bravman, J. and Sinclair, R., J. Elec. Microsc. Techs., 1, 53 (1984).Google Scholar
14. Csepregi, L., Kennedy, E. F., Mayer, J. W. and Sigmon, T. W., J. Appl. Phys. 49, 3906 (1978).Google Scholar
15. Csepregi, L., Kennedy, E. F., Callagher, T. J., Mayer, J. W. and Sigmon, T. W., J. Appl.Phys. 48, 4234 (1977).Google Scholar
16. Fan, J. C. C. and Anderson, C. H. Jr., J. Appl. Phys., 52, 4003 (1981).CrossRefGoogle Scholar