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Initial growth stages of CeO2 nanosystems by Plasma-Enhanced Chemical Vapor Deposition

Published online by Cambridge University Press:  11 February 2011

Davide Barreca ,
Alberto Gasparotto ,
Eugenio Tondello ,
Stefano Polizzi ,
Alvise Benedetti ,
Cinzia Sada ,
Giovanni Bruno  and
Maria Losurdo
Davide Barreca
Affiliation:
ISTM-CNR and CIMA Department, Padova University, Via Marzolo, 1 – 35131 Padova, Italy.
Alberto Gasparotto
Affiliation:
ISTM-CNR and CIMA Department, Padova University, Via Marzolo, 1 – 35131 Padova, Italy.
Eugenio Tondello
Affiliation:
ISTM-CNR and CIMA Department, Padova University, Via Marzolo, 1 – 35131 Padova, Italy.
Stefano Polizzi
Affiliation:
Physical Chemistry Department, Ca'Foscari Venice University, Via Torino, 155/B - 30170, Venezia-Mestre, Italy.
Alvise Benedetti
Affiliation:
Physical Chemistry Department, Ca'Foscari Venice University, Via Torino, 155/B - 30170, Venezia-Mestre, Italy.
Cinzia Sada
Affiliation:
INFM and Physics Department, Padova University, Via Marzolo, 8 – 35131 Padova, Italy.
Giovanni Bruno
Affiliation:
IMIP-CNR, via Orabona, 4 – 70126 Bari, Italy.
Maria Losurdo
Affiliation:
IMIP-CNR, via Orabona, 4 – 70126 Bari, Italy.
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Abstract

Nanocrystalline CeO2 thin films were synthesized by Plasma-Enhanced Chemical Vapor Deposition using Ce(dpm)4 as precursor. Film growth was accomplished at 150–300°C either in Ar or in Ar-O2 plasmas on SiO2 and Si(100) with the aim of studying the effects of substrate temperature and O2 content on coating characteristics. Film microstructure as a function of the synthesis conditions was investigated by Glancing Incidence X-Ray Diffraction (GIXRD) and Transmission Electron Microscopy (TEM), while surface morphology was analyzed by Atomic Force Microscopy (AFM). Surface and in-depth chemical composition was studied by X-ray Photoelectron Spectroscopy (XPS) and Secondary Ion Mass Spectrometry (SIMS).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 756: Symposia EE/FF – Solid-State Ionics – Materials for Fuel Cells and Fuel Processors , 2002 , EE9.10
Copyright
Copyright © Materials Research Society 2003

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References

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