Skip to main content Accessibility help
×
Home

Influence of Nitrogen Bonds on electrical properties of HfAlOx(N) films fabricated through LL-D&A process using NH3

  • Kunihiko Iwamaoto (a1), Tomoaki Nishimura (a2), Koji Tominaga (a1), Tetsuji Yasuda (a2), Koji Kimoto (a3), Toshihide Nabatame (a1) and Akira Toriumi (a2) (a4)...

Abstract

We have investigated the influence of nitrogen incorporation into the HfAlO x film prepared by LL-D&A process with NH3 annealing step on structural change and electrical properties. Also, we have evaluated the effects of PDA treatment on electrical properties. Nitrogen concentration in HfAlO x (N) film was enhanced with increasing the NH3 annealing temperature. The shift of Hf 4f average binding energy towards lower side was observed in proportion to nitrogen concentration in HfAlO x (N) film. This result indicates the partial change of the local coordination from O-Hf-O to O-Hf-N. The increase of O-Hf-N component drastically degraded the gate leakage current in HfAlO x (N) film. Nitrogen atoms still maintained in HfAlO x (N) film even after PDA at 850°C in O2 ambient. PDA treatment at higher temperature after D&A(NH3) process improved the flat-band voltage shift and the electron mobility.

Copyright

References

Hide All
[1] Lee, S.J. et al., IEEE Int. Electron Device Mtg., p. 223 (2000).
[2] Jung, H. S. et al., IEEE Int. Electron Device Mtg. p. 853 (2002).
[3] Koyama, M. Et al., IEEE Int. Electron Device Mtg., p 849 (2002).
[4] Visokay, M. R. et al., Appl. Phys. Lett. 80, 3181 (2002).
[5] Koyama, M. et al., Extended Abstract SSDM p. 48 (2003).
[6] Nabatame, T. et al., VLSI Tech. Symp., p. 25 (2003).
[7] Iwamoto, K. et al., Abstract NO.918, in 203rd ECS Meeting Paris (2003).
[8] Tominaga, K. et al., Extended Abstract SSDM p. 48 (2003).
[9] Nishimura, T. et al., Extended Abstract IWGI p. 180 (2003).

Influence of Nitrogen Bonds on electrical properties of HfAlOx(N) films fabricated through LL-D&A process using NH3

  • Kunihiko Iwamaoto (a1), Tomoaki Nishimura (a2), Koji Tominaga (a1), Tetsuji Yasuda (a2), Koji Kimoto (a3), Toshihide Nabatame (a1) and Akira Toriumi (a2) (a4)...

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed