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Improvement in Wide-Gap A-SI:H For High-Efficiency Solar Cells

  • Sadaji Tsuge (a1), Yoshihiro Hishikawa (a1), Shingo Okamoto (a1), Manabu Sasaki (a1), Shinya Tsuda (a1), Shoichi Nakano (a1) and Yukinori Kuwano (a1)...

Abstract

A hydrogen-plasma treatment has been used for the first time to fabricate wide-gap, high-quality a-Si:H films. The hydrogen content (CH) of a-Si:H films substantially increases by the hydrogen-plasma treatment after deposition, without deteriorating the opto-electric properties of the films. The photoconductivity (σph) of ≥ 10-5 ο-1 cm-1, photosensitivity ( σ ph/σ d) of > 106 and SiH2/SiH of <0.2 are achieved for a film with CH of ∼25 atomic >%. The optical gap of the film is > 1.70 eV by the (α h ν )1/3 plot, and is >2 eV by the Tauc's plot. The open circuit voltage of a-Si solar cells exceeds 1 V conserving the fill factor of > 0.7 when the wide-gap a∼Si:H films are used as the i-layer, which proves the wide band gap and low defect density.

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[1] Hishikawa, Y., Tsuge, S., Nakamura, N., Tsuda, S., Nakano, S., Ohnishi, M. and Kuwano, Y. in Amorphous Silicon Technology, edited by Taylor, P.C., Thompson, M.J., LeComber, P.G., Hamakawa, Y. and Madan, A. (Mater. Res. Soc. Proc. 192, San Francisco, 1990) 511
[2] Hishikawa, Y., Tsuge, S., Nakamura, N., Wakizaka, K., Kouzuma, S., Tsuda, S., Nakano, S., Kishi, Y. and Kuwano, Y., J. Non-Cryst. Solids 137&138, 717 (1991)
[3] Nishiwaki, H., Ohnishi, M., Haku, H., Dohjoh, H., Sayama, K., Hishikawa, Y., Nakashima, Y., Wakizaka, K., Tsuda, S., Nakano, S., Kishi, Y. and Kuwano, Y. in Proceedings of the 6th International Photovoltaic Science and Engineering Conference, India, 469 (1992)
[4] Hishikawa, Y., Nakamura, N., Tsuda, S., Nakano, S., Kishi, Y. and Kuwano, Y., Jpn. J. Appl. Phys. 30, 1008 (1991)
[5] LeComber, P.G., Loveland, R.J., Spear, W.E. and Vaughan, R.A. in Proceedings of the 5th International Conference on Amorphous and Liquid Semiconductors, Garmisch-Partenkirchen, 1973 (1974)
[6] Nakamura, M., Ohno, T., Miyata, K., Konishi, N. and Suzuki, T., J. Appl. Phys. 65. 3061 (1989)
[7] Shirai, H., Hanna, J. and Shimizu, I. in Amorphous Silicon Technology, edited by Madan, A., Hamakawa, Y., Thompson, M.J., Taylor, P.C. and LeComber, P.G. (Mater. Res. Soc. Proc. 219, Anaheim, 1991) 643
[8] Asano, A., Appl. Phys. Lett. 56, 533(1990)

Improvement in Wide-Gap A-SI:H For High-Efficiency Solar Cells

  • Sadaji Tsuge (a1), Yoshihiro Hishikawa (a1), Shingo Okamoto (a1), Manabu Sasaki (a1), Shinya Tsuda (a1), Shoichi Nakano (a1) and Yukinori Kuwano (a1)...

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