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Hydrogenation of Gallium Nitride

Published online by Cambridge University Press:  22 February 2011

M. S. Brandt
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Road, Palo Alto CA 94304
N. M. Johnson
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Road, Palo Alto CA 94304
R. J. Molnar
Affiliation:
Department of Electrical, Computer, and Systems EngineeringBoston University, Boston, MA 02215
R. Singh
Affiliation:
Department of Electrical, Computer, and Systems EngineeringBoston University, Boston, MA 02215
T. D. Moustakas
Affiliation:
Department of Electrical, Computer, and Systems EngineeringBoston University, Boston, MA 02215
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Abstract

A comparative study of the effects of hydrogen in n-type (unintentionally and Si-doped) as well as p-type (Mg-doped) MBE-grown GaN is presented. Hydrogenation above 500°C reduces the hole concentration at room temperature in the p-type material by one order of magnitude. Three different microscopic effects of hydrogen are suggested: Passivation of deep defects and of Mg-acceptors due to formation of hydrogen-related complexes and the introduction of a hydrogenrelated donor state 100 meV below the conduction band edge.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

[1] Hydrogen in Semiconductors, edited by Pankove, J. I. and Johnson, N. M. (Academic, San Diego, 1991).Google Scholar
[2] Wolk, J. A., Ager, J. W. III, Duxstad, K. J., Hailer, E. E., Taskar, N. R., Dorman, D. R., and Olego, D. J., Appl. Phys. Lett. 63, 2756 (1993).Google Scholar
[3] Amano, H., Kito, M., Hiramatsu, K., and Akasaki, I., Jpn. J. Appl. Phys. 28, L2112 (1989).Google Scholar
[4] Moustakas, T. D. and Molnar, Rt. J., Mat. Res. Soc. Conf. Proc. 281, 753 (1993).Google Scholar
[5] Pankove, J. I. and Hutchby, J. A., J. Appl. Phys. 47, 5387 (1976).Google Scholar
[6] Nakamura, S., Mukai, T., Senoh, M., and Iwasa, N., Jpn. J. Appl. Phys. 31, L139 (1992), S. Nakamura, N. Iwasa, M. Senoh, and T. Mukai, Jpn. J. Appi. Phys. 31, 1258 (1992).CrossRefGoogle Scholar
[7] Ager, J. and Götz, W., private communication.Google Scholar
[8] Vechten, J. A. Van, Zook, J. D., Horning, R. D., and Goldenberg, B., Jpn. J. Appi. Phys. 31, 3662 (1992).Google Scholar