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High–Resolution Low Energy Electron Diffraction Study of Surface Instabilities and Growth Dynamics

Published online by Cambridge University Press:  21 February 2011

H.-N. Yang
Affiliation:
Department of Physics, Rensselaer Polytechnic Institute, Troy, NY 12180–3590
J.-K. Zuot
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831–6024
K. Fang
Affiliation:
Department of Physics, Rensselaer Polytechnic Institute, Troy, NY 12180–3590
T.-M. Lu
Affiliation:
Department of Physics, Rensselaer Polytechnic Institute, Troy, NY 12180–3590
G.-C. Wang
Affiliation:
Department of Physics, Rensselaer Polytechnic Institute, Troy, NY 12180–3590
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Abstract

Recent advances in high–resolution low–energy electron diffraction (HRLEED) techniques have led to a new capability which provides both very high spatial and temporal resolutions to probe quantitatively the equilibrium and dynamical processes that occur on surfaces and growth fronts. These techniques are especially powerful when the surface or growth front contains atomic steps. Different distributions of steps give different surface atomic pair correlation functions and therefore different angular profile shapes in the diffraction pattern. Recent examples of quantitative HRLEED study of low index plane equilibrium roughening and preroughening transitions are presented. In the growth dynamics, both two–level and multilevel step structures are considered. Examples of the measurements of growth exponents and dynamics scaling are presented.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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