Skip to main content Accessibility help
×
Home

High Sensitivity Convergent Beam Electron Diffraction for the Determination of the Tetragonal Distortion of Epitaxial Films

  • C. Schuer (a1), M. Leicht (a2), T. Marek (a1) and H.P. Strunk (a1)

Abstract

We have optimized the sensitivity of convergent beam electron diffraction (CBED) by orienting the specimen such that the central (000) diffraction disc shows a pattern of defect lines that are most sensitive to tetragonal distortion. We compare the position of these lines in the experimentally obtained patterns with results from computer simulations, which need to be based on dynamical diffraction theory. In both experimental and simulated patterns the positions of the defect lines are determined by applying a Hough transformation. As a result of this optimized approach, we can measure the tetragonal distortion of a low temperature grown GaAs layer as low as 0.04%.

Copyright

References

Hide All
1. Melloch, M.R., Woodall, J.M., Harmon, E.S., Otsuka, N., Pollak, F.H., Nolte, D.D., Feenstra, R.M., Lutz, M.A.; Annu. Rev. Mater. Sci. 25, 547 (1995).10.1146/annurev.ms.25.080195.002555
2. Liu, X., Prasad, A., Nishio, J., Weber, E.R., Liliental-Weber, Z., Walukiewicz, W.; Appl. Phys. Lett. 67, 279 (1995).10.1063/1.114782
3. Fatemi, M., Tadayon, B., Twigg, M.E., Dietrich, H.B.; Phys. Rev. B 48, 8911 (1993).10.1103/PhysRevB.48.8911
4. Schür, C., Leicht, M., Marek, T., Strunk, H.P., Tautz, S., Kiesel, P., Geiβelbrecht, W., Malzer, S., Döhler, G.H. in Symposium On Non-Stoichiometric III-V Compounds, edited by Kiesel, P., Malzer, S., Marek, T. (Verlag Lehrstuhl fuer Mikrocharakterisierung, Erlangen, 1998, ISBN: 3-932392-12-4) p. 41.
5. Krämer, S., Mayer, J.; Journal of Microscopy 194, 2 (1999).10.1046/j.1365-2818.1999.00475.x
6. Stadelmann, P.A.; Ultramicroscopy 21, 131 (1987).10.1016/0304-3991(87)90080-5
7. Ruff, M., Streb, D., Dankowski, S.U., Tautz, S., Kiesel, P., Knüpfer, B., Kneissl, M., Linder, N., Döhler, G.H., Keil, U.D.; Appl. Phys. Lett. 68, 2968 (1996).10.1063/1.116371
8. Marek, T., Berta, R., Schür, C., Tautz, S., Kiesel, P., Kunsagi-Mate, S., Strunk, H.P. in 2nd Symposium On Non-Stoichiometric III-V Compounds, edited by Marek, T., Malzer, S., Kiesel, P. (Verlag Lehrstuhl fuer Mikrocharakterisierung, Erlangen, 1999, ISBN: 3-932392-19-1), p. 103.
9. Madelung, O. (editor), Semiconductors: Group IV Elements and III-V Compounds (Data in Science and Technology), (Springer-Verlag, Berlin, 1991, ISBN: 3-540-53150-5) p. 104.10.1007/978-3-642-45681-7

High Sensitivity Convergent Beam Electron Diffraction for the Determination of the Tetragonal Distortion of Epitaxial Films

  • C. Schuer (a1), M. Leicht (a2), T. Marek (a1) and H.P. Strunk (a1)

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed