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High Quality NiFe/Ag Superlattices Made by Pulsed Laser Deposition (PLD)

  • Randolph E. Treece (a1), Paul Dorsey (a1), James S. Horwitz (a1), Syed Qadri (a1) and Douglas B. Chrisey (a1)...


High-quality thin-film superlattices of permalloy (NiFe) and silver (Ag) have been grown by pulsed laser deposition (PLD) for the first time. The alternating metallic layers weregrown from individual NiFe and Ag targets utilizing an automated multi-target holder coupled to a conventional PLD system. The targets were ablated at a base pressure of 4×10−7 Torr and the material deposited on room-temperature (100) silicon and on fused silica substrates. The films were characterized by X-ray diffraction (XRD), magnetic field-dependent resistivity, and ferromagnetic resonance (FMR). XRD was used to confirm uniform bilayer thicknesses. The magnetic field-dependent resistance measurements indicated the presence of magnetoresistance in the deposited films. An as-deposited film with a bilayer thickness of 75 Å demonstrated a roomtemperature magnetoresistive effect of 0.15 %. FMR has been used to determine the relationship between NiFe magnetism and the observed magnetoresistance.



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1 Baibich, M. N., Broto, J. M., Fert, A., Dau, F. Nguyen Van, and Petroff, F., Phys. Rev. Lett. 61, 2472 (1992).
2 Xiao, J. Q., Jiang, J. S., Chien, C.L., Phys. Rev. Lett. 68, 3749 (1992).
3 Broader discussions of PLD are reviewed in Pulsed Laser Deposition of Thin Films, edited by Chrisey, D. B. and Hubler, G. K., (Wiley, New York, 1994)
4 Growth of electronic ceramics by PLD is reviewed in Horwitz, J. S., Chrisey, D. B., Grabowski, K. S. and Leuchtner, R. E., Surf. Coatings Technol. 51, 290 (1992).
5 Parker, M. A., Hylton, T. L., Hylton, K. R., and Howard, J. K., J. Appl. Phys. 75, 6382 (1994)
6 Treece, R. E., Horwitz, J. S., Claassen, J. H., and Chrisey, D. B., Appl. Phys. Lett. 65, 2860 (1994); R. E. Treece, J. S. Horwitz, and D. B. Chrisey, Mater. Res. Soc. Proc. 343, 747 (1994); R. E. Treece, J. S. Horwitz, D. B. Chrisey, E. P. Donovan, and S. B. Qadri, Chem. Mater., 6, 2205 (1994).


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