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Hg1−x−yMnxCdyTe Alloys for 1.3−1.8 μm Photodiode Applications

  • S. H. Shin (a1), J. G. Pasko (a1), D. S. Lo (a1), W. E. Tennant (a1), J. R. Anderson (a2), M. Gorsk (a2), M. Fotouhi (a2) and C. R. Lu (a2)...

Abstract

HgMnCdTe/CdTe photodiodes with responsivity cutoffs of up to 1.54 pm have been fabricated by liquid phase epitaxy (LPE). The mesa device structure consists of a boron-implanted mosaic fabricated on a p-type Hg1−x−yMnxCdyTe layer grown on a CdTe substrate. A reverse breakdown voltage (VB) of 50 V and a leakage current density of 1.5 × 10−4 A/cm2 at V = −10 V was measured at room temperature (295K). A 0.75 pF capacitance was also measured under a 5 V reverse bias at room temperature. This device performance based on the quaternary HgMnCdTe shows both theoretical and practical promise of superior performance for wavelengths in the range 1.3 to 1.8 μm for fiber optic applications.

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Hg1−x−yMnxCdyTe Alloys for 1.3−1.8 μm Photodiode Applications

  • S. H. Shin (a1), J. G. Pasko (a1), D. S. Lo (a1), W. E. Tennant (a1), J. R. Anderson (a2), M. Gorsk (a2), M. Fotouhi (a2) and C. R. Lu (a2)...

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