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H-Atom Assisted jet Vapor Deposition of Parylene-n polymer

  • B. L. Halpern (a1), P. Komarenko (a1), R. F. Graves (a1), P. D. Fuqua (a1), J. F. Mcdonald (a2), G.-R. Yang (a2), L. Wang (a2), T. M. Lu (a2), M. Tomozawa (a2) and I. Maitthew (a2)...

Abstract

We describe a new approach to deposition of Parylene N thin films. It utilizes a small scale, sonic speed, Jet Vapor DepositionTM (JVDTM) process technology in place of the conventional larger scale, slow flow, Gorham apparatus. It employs a simple but powerful strategy to promote radical polymerization: exposure of the growing film, during deposition, to a high flux of atomic hydrogen. We believe that H atoms have two effects: they clean oxygen from the substrate, and they promote crosslinking in the Parylene film by abstraction of H atoms from the Parylene ring or side groups. With “H atom assisted JVD” Parylene N deposits and adheres even on warm substrates; it has reduced index of refraction and dielectric constant.

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[1] Halpern, B.L. and Schmitt, J.J., in Deposition Technologies for Thin Films and Coatings, Bunshah, R.F., Editor, Noyes Publications, Park Ridge, NJ, 2nd edition,1994
[2] Schmitt, J.J. and Halpern, B.L., U.S. Patent No. 4,788,082, November 29, 1988 J.J. Schmitt and B.L. Halpern. U.S. Patent No. 5,256,205, October 26, 1993
[3] Halpern, B.L. and Graves, R.F., patent applied for
[4] Szwarc, M.J., Disc. Far. Soc. 2 46 (1957); W. F. Gorham, U.S. Patent 3,342,754, September 19, 1967
[5] Beach, W.F., Lee, C., Bassett, D.R., Austin, T.M, and Olson., R. Encyclopedia of Polymer Science and Engineering, Vol.17 990 (1989)
[6] Taylor, K. and Malkin, I., Polymer Letters, 2 597599 (1964)
[7] Callebert, F., Supiot, Ph., Asfardjani, K., Dessaux, O., Goudmand, P., Dhamelincourt, P., and Laureyns, J., Journal of Applied Polymer Science 52 1595 (1994)
[8] Kerr, J.A. and Moss, S.J.; CRC Handbook of Bimolecular and Termolecular Gas Reactions, VI, CRC Press Inc. Boca Raton.

H-Atom Assisted jet Vapor Deposition of Parylene-n polymer

  • B. L. Halpern (a1), P. Komarenko (a1), R. F. Graves (a1), P. D. Fuqua (a1), J. F. Mcdonald (a2), G.-R. Yang (a2), L. Wang (a2), T. M. Lu (a2), M. Tomozawa (a2) and I. Maitthew (a2)...

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