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Hardness of Thin Films Determined Based on Nanoindentation Load and Contact Stiffness

Published online by Cambridge University Press:  10 February 2011

D. S. Stone ,
M. F. Tambwe ,
H. Kung  and
M. Nastasi
D. S. Stone
Affiliation:
Materials Science and Engineering, University of Wisconsin-Madison
M. F. Tambwe
Affiliation:
Materials Science and Engineering, University of Wisconsin-Madison
H. Kung
Affiliation:
Division of Materials Science and Technology, Los Alamos National Laboratory
M. Nastasi
Affiliation:
Division of Materials Science and Technology, Los Alamos National Laboratory
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Abstract

A model for the elastic contact between an indenter and a layered half-space allows the projected contact area to be estimated based on measured contact stiffness. In this way, the model allows the hardness to be determined indirectly based solely on load and contact stiffness rather than load and contact area. We apply the approach to Cu, Nb, and Cu/Nb multilayer thin films on Si.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 522: Symposium T – Fundamentals of Nanoindentation & Nanotribology , 1998 , 257
Copyright
Copyright © Materials Research Society 1998

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References

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