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Hardness of Thin Films Determined Based on Nanoindentation Load and Contact Stiffness
Published online by Cambridge University Press: 10 February 2011
Abstract
A model for the elastic contact between an indenter and a layered half-space allows the projected contact area to be estimated based on measured contact stiffness. In this way, the model allows the hardness to be determined indirectly based solely on load and contact stiffness rather than load and contact area. We apply the approach to Cu, Nb, and Cu/Nb multilayer thin films on Si.
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- Copyright © Materials Research Society 1998
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