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Hardness Measurements on Anode and Cathode Mounted, Plasma Deposited Amorphous Hydrogenated Carbon

Published online by Cambridge University Press:  22 February 2011

Shu-Han Lin ,
Bernard J. Feldman ,
Dong Li ,
Yip-Wah Chung ,
Mingshow Wong  and
William D. Sproul
Shu-Han Lin
Affiliation:
Department of Physics and Center for Molecular Electronics, University of Missouri, St. Louis, MO 63121
Bernard J. Feldman
Affiliation:
Department of Physics and Center for Molecular Electronics, University of Missouri, St. Louis, MO 63121
Dong Li
Affiliation:
Department of Materials Science and Engineering and Center for Engineering Tribology, Northwestern University, Evanston, IL 60208
Yip-Wah Chung
Affiliation:
Department of Materials Science and Engineering and Center for Engineering Tribology, Northwestern University, Evanston, IL 60208
Mingshow Wong
Affiliation:
BIRL Industrial Research Laboratory, Northwestern University, Evanston, IL 60201
William D. Sproul
Affiliation:
BIRL Industrial Research Laboratory, Northwestern University, Evanston, IL 60201
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Abstract

We have measured the microhardness of various amorphous hydrogenated carbon thin films that were grown on both the anode and the cathode of our plasma deposition system. We observe no difference in microhardness between films with the same optical bandgap, whether grown on the cathode or on the anode. We conclude that the ion bombardment during cathode growth does not contribute to the hardness of the films. In contrast, we observe a large variation in microhardness as a function of optical bandgap. We conclude that it is increasing hydrogen concentration, found primarily in the clusters and not in the crosslinks, that decreases the hardness of our films. Finally, we observe that the addition of nitrogen to our films does not change the microhardness; again, the hardness is primarily determined by the hydrogen concentration.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 349: Symposium T – Novel Forms of Carbon II , 1994 , 519
Copyright
Copyright © Materials Research Society 1994

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References

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