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The Hardness and Elastic Modulus of TiN Films as Determined by Ultra-Low Load Indentation

Published online by Cambridge University Press:  16 February 2011

M. E. O'Hern ,
W. C. Oliver ,
C. J. McHargue ,
D. S. Rickerby  and
S. J. Bull
M. E. O'Hern
Affiliation:
Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, TN 37831-6118.
W. C. Oliver
Affiliation:
Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, TN 37831-6118.
C. J. McHargue
Affiliation:
Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, TN 37831-6118.
D. S. Rickerby
Affiliation:
Materials Development Division, Harwell Laboratory, Didcot, Oxfordshire OX11 ORA, UK
S. J. Bull
Affiliation:
Materials Development Division, Harwell Laboratory, Didcot, Oxfordshire OX11 ORA, UK
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Abstract

The mechanical properties of a series of titanium nitride films on stainless steel substrates have been evaluated using an indentation technique with a mechanical properties microprobe (MPM). The MPM makes possible measurement of film properties without contribution by the substrate material. The titanium nitride films were deposited with a PVD technique known as sputter ion plating (SIP). Deposition substrate bias was varied from 0 to −120 V, while keeping other deposition parameters constant. With increasing negative substrate bias, dramatic increases in hardness and elastic modulus have been observed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 188: Symposium K – Thin Films: Stresses and Mechanical Properties II , 1990 , 139
Copyright
Copyright © Materials Research Society 1990

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References

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