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Growth of Thick InN by Molecular Beam Epitaxy

Published online by Cambridge University Press:  11 February 2011

Hai Lu ,
William J. Schaff ,
Lester F. Eastman ,
J. Wu ,
Wladek Walukiewicz ,
David C. Look  and
Richard J. Molnar
Hai Lu
Affiliation:
Department of Electrical and Computer Engineering, Cornell University Ithaca, NY 14853
William J. Schaff
Affiliation:
Department of Electrical and Computer Engineering, Cornell University Ithaca, NY 14853
Lester F. Eastman
Affiliation:
Department of Electrical and Computer Engineering, Cornell University Ithaca, NY 14853
J. Wu
Affiliation:
Lawrence Berkeley National Laboratory, Berkeley, CA 94720
Wladek Walukiewicz
Affiliation:
Lawrence Berkeley National Laboratory, Berkeley, CA 94720
David C. Look
Affiliation:
Semiconductor Research Center, Wright State University, Dayton, OH 45435
Richard J. Molnar
Affiliation:
MIT Lincoln Laboratory, Lexington, MA 02420
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Abstract

In this study, InN films with thickness up to 7.5 micron were prepared by molecular beam epitaxy (MBE) on (0001) sapphire and quasi-bulk GaN templates. Previously it has been challenging to grow InN film much beyond 1 micron because the growing surface tended to become rough. Techniques to overcome this limit have been developed. Various buffer techniques were used and compared to optimize the epitaxial growth. It was found that with increasing film thickness, Hall mobility will monotonically increase, while carrier concentration decreases. Hall mobility beyond 2100 cm2/Vs with carrier concentration close to 3×1017 cm−3 was obtained at room temperature. Compared with the lowest carrier concentration ∼2×1018 cm−3 obtained on thin InN films grown at the same condition, the conclusion is that impurities from the growth environment are not responsible for the high background doping of InN. Instead, some structural defects or substrate/buffer impurities may be the major source of the unintentional doping, which can be reduced by growing thicker films.

Some results on Mg and Be doping of InN will be reported as well. To date, all Mg and Be doping attempts have resulted in n-type material.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 743: Symposium L – GaN and Related Alloys , 2002 , L4.10
Copyright
Copyright © Materials Research Society 2003

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References

REFERENCES

1. Lu, H., Schaff, W. J., Hwang, J., Wu, H., Goutam, K. and Eastman, L. F., Appl. Phys. Lett. 79, 1489 (2001).Google Scholar
2. Higashiwaki, M. and Matsui, T., Jpn. J. Appl. Phys. 41, L540 (2002).Google Scholar
3. Davydov, V. Yu., Klochikhin, A. A., Seisyan, R. P., Emtsev, V. V., Ivanov, S. V., Bechstedt, F., Furthmuller, J., Harima, H., Mudryi, A. V., Aderhold, J., Semchinova, O., and Graul, J., Phys. Stat. Solidi (b), 229, R1 (2002).Google Scholar
4. Wu, J., Walukiewicz, W., Yu, K. M., Auger, J. W. III, Haller, E. E., Lu, H., Schaff, W. J., Saito, Y. and Nanishi, Y., Appl. Phys. Lett. 80, 3967 (2002).Google Scholar
5. Matsuoka, T., Okamoto, H., Nakao, M. and Kurimoto, E., Appl. Phys. Lett. 81, 1246 (2002).Google Scholar
6. Manfra, M. J., Weimann, N. G., Hsu, J. W. P., Pfeiffer, L. N., West, K. W., Syed, S., Stormer, H. L., Pan, W., Lang, D. V., Chu, S. N. G., Kowash, G., Sergent, A. W., Caissie, J., Molvar, K. M., Mahoney, L. J. and Molnar, R. J., J. Appl. Phys. 92, 338 (2002).Google Scholar
7. Lu, H., Schaff, W. J., Hwang, J., Wu, H., Yeo, W., Pharkya, A., and Eastman, L. F., Appl. Phys. Lett. 77, 2548 (2000).Google Scholar
8. Look, D. C., Lu, H., Schaff, W. J., Jasinski, J. and Liliental-weber, Z., Appl. Phys. Lett. 80, 258 (2002),Google Scholar
9. Cai, J. and Ponce, F. A., Phys. Stat. Sol. (a), 192, 407 (2002).Google Scholar
10. Lu, H., Schaff, W. J., Hwang, J. and Eastman, L. F., MRS Spring Meeting (April 16–20, 2001, San Francisco, CA). on Mater. Res. Soc. Symp. (2001), 680E, E3.2.Google Scholar