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Glass Transition Temperature Of Ultrathin Polymer Films On Silicon

  • Wen-Li Wu (a1), William E Wallace (a1) and John Van Zanten (a1)

Abstract

The glass transition temperature, Tg, of polystyrene (PS) thin films on silicon wafers with different surface preparations was determined in order to explore the effect of interfacial interaction energy on local chain dynamics. To enhance interface behavior, the film thickness included in this work was as low as 50 Å. PS with monodisperse molecular weights was chosen as a model polymer. Two different silicon surfaces were prepared: sulfuric acid-clean and hydrogen passivated. Tg of thin films was determined by monitoring the film thickness as a function of temperature. Tgwas identified as the temperature where the thermal expansion coefficient underwent an abrupt change. X-ray reflectivity was used to determine film thickness with a precision of a few angstroms. Tg of PS was found to depend strongly on the initial film thickness, as well as the substrate surface.

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[1] See Physics of Polymer Surfaces and Interfaces, edited by Sanchez, I.C. (Butterworth-Heineman, Boston, 1992).
[2] Theodorou, D.N., in Physics of Polymer Surfaces and Interfaces, edited by Sanchez, I.C.. (Butterworth-Heineman, Boston, 1992) and references therein.
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[9] Certain commercial companies are named in order to specify adequately the experimental procedures utilized in this study. This in no way implies endorsement or recommendation by NIST.
[10] Polymer Handbook 2nd Edition, Brandrup, J. and Immergut, E.H. Eds., Wiley-Interscience (1975).

Glass Transition Temperature Of Ultrathin Polymer Films On Silicon

  • Wen-Li Wu (a1), William E Wallace (a1) and John Van Zanten (a1)

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