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Formation of 3-Dimensionally Orientated Nano-sized Crystals in an Amorphous Alloy under Ion Beam Irradiation

Published online by Cambridge University Press:  11 February 2011

Takuya Kamikawa
Affiliation:
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226–8503, Japan
Ryuichi Tarumi
Affiliation:
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226–8503, Japan
Kazuki Takashima
Affiliation:
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226–8503, Japan
Yakichi Higo
Affiliation:
Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226–8503, Japan
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Abstract

We have succeeded to form three-dimensionally orientated nano-sized crystals in a Ni-P amorphous alloy under focused ion beam (FIB) irradiation. The FIB micro-fabrication was performed on an electroless deposited Ni-P amorphous alloy and thin films with a thickness of 100 nm were prepared. Transmission electron microscopy (TEM) observation for irradiated areas revealed the formation of crystallographically orientated nano-sized crystals (NCs) in the irradiated region. The grain size of NCs was less than 10 nm in diameter. Electron diffraction analysis showed that the formed NCs have a face-centered-cubic (f.c.c.) structure and the following orientation relationships among the specimen, the NCs and the FIB direction: irradiated plane // {111}f.c.c. and ion beam direction // <110>f.c.c..

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

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References

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