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The Formation and Morphology of Stress Induced Voids in Thin Narrow Aluminum Lines

  • C. A. Paszkiet (a1), M. A. Korhonen (a1) and Che-Yu Li (a1)

Abstract

Thin, narrow, lines were reactive ion etched from a highly textured aluminum film deposited on (100) silicon substrates; some arrays of lines were covered with a passivation layer of silicon nitride. Passivated and unpassivated lines were heat treated at 400°C.

Voids were present in nitride covered lines which were aged for over three months at room temperature as well as in nitride covered lines examined immediately after heat treatment. Voids were not visible in bare, heat treated lines. Void nucleation occurred at the points of intersection of grain boundaries with line edges and growth appeared to follow grain boundaries.

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[1] Klema, Jon, Pyle, Ronald, and Domangue, Edward. Reliability implications of nitrogen contamination during deposition of sputtered aluminum/silicon metal films. IEEE International Reliability Physics Symposium, 22:15, 1984.
[2] Curry, J., Fitzgibbon, G., Guan, Y., Muollo, R., Nelson, G., and Thomas, A.. New failure mechanisms in sputtered aluminum-silicon films. IEEE International Reliability Physics Symposium, 22:68, 1984.
[3] Turner, T. and Wendel, K.. The influence of stress on aluminum conductor life. IEEE International Reliability Physics Symposium, 23:142147, 1985.
[4] Hinode, K., Owada, N., Nishida, T., and Mukai, K.. Stress-induced grain boundary fractures in Al-Si interconnects. Journal of Vacuum Science and Technology B, 5(3):518522, March/April 1987.
[5] Li, Che-Yu, Black, Ronald D., and LaFontaine, William R.. Analysis of thermal stress-induced grain boundary cavitation and notching in narrow Al-Si metallizations. Applied Physics Letters, 53(l):3133, July 1988.
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[7] Paszkiet, C. A., Korhonen, M. A., and Li, Che-Yu. Stress relaxation and void formation in narrow aluminum lines. Manuscript in preparation.

The Formation and Morphology of Stress Induced Voids in Thin Narrow Aluminum Lines

  • C. A. Paszkiet (a1), M. A. Korhonen (a1) and Che-Yu Li (a1)

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