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The Finite Size Effect on The Metal-Insulator Transition of VO2 Films Grown by MOCVD

  • Hyung Kook Kim (a1), R. P. Chiarello (a1), Hoydoo You (a1), M. H. L. Chang (a1), T. J. Zhang (a1) and D. J. LAM (a1)...

Abstract

We studied the finite size effect on the metal-insulator phase transition and the accompanying tetragonal to monoclinic structural phase transition of VO2 films grown by MOCVD. X-ray diffraction measurements and electrical conductivity measurements were done as a function of temperature for VO2 films with out-of plane particle size ranging from 60–310Å. Each VO2 film was grown on a thin TiO2 buffer layer, which in turn was grown by MOCVD on a polished sapphire (1120) substrate. The transition was found to be first order. As the out-of plane particle size becomes larger, the transition temperature shifts and the transition width narrows. For the 60Å film the transition was observed at ∼61°C with a transition width of ∼10°C, while for the 310Å film the transition temperature was ∼59°C and the transition width ∼2°C. We also observed thermal hysteresis for each film, which became smaller with increasing particle size.

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1. For example, Feinleib, Julius and Paul, William, Phys. Rev. 155, 841 (1967);
Adler, David, Feinleib, Julius, Brooks, Harvey and Paul, William, Phys. Rev. 155, 851 (1967);
Adler, David and Brooks, Harvey, Phys. Rev. 155, 826 (1967);
Gupta, M., Freeman, A. J. and Ellis, D. E., Phys. Rev. B 16, 3338 (1977);
Gervais, F. and Press, W., Phys. Rev. B 31, 4809 (1985).
2. Morin, F. J., Phys. Rev. Lett. 3, 34 (1959);
Shin, S. et. al., Phys. Rev. B 41, 4993 (1990) and references therein.
3. Shapiro, S. M., Axe, J. D., Shirane, G. and Raccah, P. M., Solid Phys. Rev. B 13, 2965 (1976).
4. Terauchi, H. and Cohen, J. B., Phys. Rev. B 17, 2494 (1978);
McWhan, D. B., et. al., Phys. Rev. B 10, 490 (1974);
Anderson, G., Acta Chem. Scand. 8, 1599 (1954).
5. Chang, H. L. M., et. al., submitted to J. Mat. Res., and references therein.
6. Kazuno, E., Theil, J. A. and Thornton, John A., J. Vac. Sci. Technol. A 6, 1663 (1988) and references therein.
7. Binder, Kurt, Rep. Prog. Phys. 50, 783 (1987) and references therein.
8. Chang, H. L. M. et. al., EUROCVD Eighth Meeting (1991) and references therein.
9. Kim, H.K., et. al., to be published.
10. Warren, B. E., “X-ray Diffraction” (Dover, 1990).
11. Babkin, E. V., et al., Thin Solid Films 150, 15 (1987).

The Finite Size Effect on The Metal-Insulator Transition of VO2 Films Grown by MOCVD

  • Hyung Kook Kim (a1), R. P. Chiarello (a1), Hoydoo You (a1), M. H. L. Chang (a1), T. J. Zhang (a1) and D. J. LAM (a1)...

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