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Fabrication of Tin Loaded Resorcinol Formaldehyde Aerogel Spheres for Extreme Ultraviolet Source Emission

  • Reny R Paguio (a1), Abbas Nikroo (a2), Chris A Frederick (a3), Jared F Hund (a4) and Mary Thi (a5)...

Abstract

Low density Sn doped resorcinol formaldehyde aerogels were fabricated for extreme ultraviolet (EUV) source emission lithography experiments (EUVL). EUVL is a candidate to succeed conventional optical lithography. EUVL requires a reliable emission (13.5 nm) source. One type of source is a laser-produced plasma. Several laser-plasma source materials have been considered such as lithium, xenon and tin. Tin is considered ideal because it has a high conversion effeciency. However, solid tin targets create a large quantity of debris which can damage the optics of the laser system. As a solution to this problem, we minimized the amount of tin by dispersing it in a low density resorcinol formaldehyde (R/F) matrix. These targets were fabricated into small spheres using the microencapsulation method. Initial experimental results show that these targets yield a similar intensity in the EUV regime when compred to a full density Sn target.

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Keywords

Fabrication of Tin Loaded Resorcinol Formaldehyde Aerogel Spheres for Extreme Ultraviolet Source Emission

  • Reny R Paguio (a1), Abbas Nikroo (a2), Chris A Frederick (a3), Jared F Hund (a4) and Mary Thi (a5)...

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