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Fabrication of Silicon on Borosilicate Glass Microarrays for Quantitative Live Cell Imaging

  • David T. Martin (a1), Sergio Sandoval (a2), Andy Carter (a3), Mark Rodwell (a3), Stefan Smith (a4), Andrew C. Kummel (a5) and Davorka Messmer (a6)...

Abstract

Planar arrays of microwells were fabricated in Silicon on borosilicate glass (pyrex) substrates in order to facilitate live cell fluorescence imaging experiments for cells sequestered inside their own individual microenvironments for incubation and quantification of single cell seceretions. Two methods of deep silicon etching were compared: cryogenic deep reactive ion etching (DRIE) and time multiplexed DIRE (Bosch Process). A 200um Si wafer was bonded to a 500um pyrex substrate. Cryogenic DRIE allowed for the reliable fabrication of 75-100um deep microwells with 60x60um openings across a 10x10mm substrate while the Bosh Process allowed for etching entirely through the Si layer, producing 200um deep microwells with transparent bottoms and steep sidewalls while maintaining the target 60x60um opening geometry.

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