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Fabrication of Microfluidic Devices for Droplet Generation based on Dry Film Resist

Published online by Cambridge University Press:  31 January 2011

Patrick William Leech ,
Nan Wu  and
Yonggang Zhu
Patrick William Leech
Affiliation:
Patrick.Leech@csiro.au, CSIRO, Gate 5 Normanby Rd, Clayton, 3169, Clayton, Victoria, 3169, Australia
Nan Wu
Affiliation:
Nan.Wu@csiro.au, CSIRO, Materials Science and Engineering, Highett, Victoria, Australia
Yonggang Zhu
Affiliation:
Yonggang.Zhu@csiro.au, CSIRO, Materials Science and Engineering, Highett, Victoria, Australia
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Abstract

Dry film resist has been used in the fabrication of Masters in microfluidic devices for droplet generation. The minimum feature size in the resist was controlled by the type of mask (transparency or electron beam Cr mask), the resolution of the pattern in transparency masks (2400 or 5080 dpi) and thickness of resist in the range from 35 to 140 μm. The Master patterns formed in dry resist were replicated as a Ni shim and then hot embossed into Plexiglas 99524. These devices were used to generate water-in-oil droplets with a well defined dependence of diameter and frequency on flow parameters. The application of dry laminar resist and transparency masks has allowed the rapid fabrication of prototype devices.

Keywords

hot pressingfluidicssurface chemistry
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1191: Symposium OO – Materials and Strategies for Lab-on-a-Chip–Biological Analysis, Cell-Material Interfaces and Fluidic Assembly of Nanostructures , 2009 , 1191-OO04-10
Copyright
Copyright © Materials Research Society 2009

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