Hostname: page-component-78c5997874-v9fdk Total loading time: 0 Render date: 2024-11-18T16:45:30.880Z Has data issue: false hasContentIssue false

Fabrication of MgIn2O4 Thin Films With Low Resistivity on MgO (100) Surface by PLD Method

Published online by Cambridge University Press:  10 February 2011

R. Noshiro
Affiliation:
Materials & Structures Laboratory, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503
K. Ueda
Affiliation:
Materials & Structures Laboratory, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503
H. Hosono
Affiliation:
Materials & Structures Laboratory, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503
H. Kawazoe
Affiliation:
R&D Center, HOYA Corp., Musashino, Akishima 196-8510, Japan, kawazoe@rdc.hoya.co.jp
Get access

Abstract

Thin films of MgIn2O4 spinel, which is a recently discovered TCO material, were deposited on MgO (100) surface by PLD. The thin films were prepared under low oxygen partial pressure to enhance formation of oxygen vacancies, from which carrier electrons were generated. X-ray analyses and AFM observations suggest epitaxial growth of the grains with diameter of 100∼200nm. The grains showed strong orientations both along the normal of the thin film and in plane. Epitaxial growth of the spinel was also confirmed by high-resolution transmission electron microscopic observations. The lattice image of the interface region suggests formation of structural imperfections such as dislocations, grain boundaries and amorphous phase in significant fraction. Strong optical absorption due to electron carriers was detected in near infrared region. Very large Burnstein-Moss shift was observed in ultraviolet region, and the optical band gap was estimated to be 4.3eV. DC conductivity observed was 4.5×103Scm−1, which is the highest value reported for the material so far. Concentration and Hall mobility of carrier electrons were found to be 2.1×1021cm−3 and 14cm2V−1s−1, respectively.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Nath, P., Bunshah, R. F., Thin Solid Films, 69, 63 (1980).Google Scholar
2 Bay, S., Banerjee, R., Basu, N., Batabyal, A. K., Bama, A. K., J. Appl. Phys., 54, 3497 (1983).Google Scholar
3 Rauf, I. A., J. Matter. Sci. Lett., 12, 1902 (1993).Google Scholar
4 Ohta, H., Orita, M., Hirano, M., Tanji, H., Kawazoe, H., Hosono, H., Appl. Phys. Lett., 76, 2740 (2000).Google Scholar
5 Ueda, N., Omata, T., Hikuma, N., Ueda, K., Mizoguchi, H., Hashimoto, T., and Kawazoe, H., Appl. Phys. Lett. 61, 1954 (1992).Google Scholar
6 Un'no, H., Hikuma, N., Omata, T., Ueda, N., Hashimoto, T., Kawazoe, H., Jpn. J. Appl Phys. 32, L1250 (1993)Google Scholar
7 Kawazoe, H., Ueda, N., Un'no, H., Omata, I., Hosono, H., Tanoue, H., J. Appl. Phys. 76, 7935 (1994).Google Scholar
8 Hosono, H., Un'no, H., Ueda, N., Kawazoe, H., Matsunami, N., Tanoue, H., Nucl. Instr. Meth. Phys. Res. B 106, 517 (1995).Google Scholar
9 Omata, T., Ueda, N., Ueda, K., Kawazoe, H., Appl. Phys. Lett. 64, 1077 (1994).Google Scholar
10 Omata, T., Ueda, N., N Hikuma, Ueda, K., Mizoguchi, H., Hashimoto, T., Kawazoe, H., Appl. Phys. Lett. 62, 499 (1993).Google Scholar
11 Hesse, D., Sieber, H., Weruer, P., Hillebrand, R., Heydenreich, J., Z. Phys. Chem. 187, 161 (1994).Google Scholar