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Fabrication and Electrical Characterization of Metal-Silicide Nanocrystals for Nano Floating Gate Nonvolatile Memory

  • Seung Jong Han (a1), Ki Bong Seo (a2), Dong Uk Lee (a3), Eun Kyu Kim (a4), Se-Mam Oh (a5) and Won-Ju Cho (a6)...

Abstract

We have fabricated the nano-floating gate memory with the TiSi2 and WSi2 nanocrystals embedded in the dielectrics. The TiSi2 and WSi2 nanocrystals were created by using sputtering and rapidly thermal annealing system, and then their morphologies were investigated by transmission electron microscopy. These nanocrystals have a spherical shape with an average diameter of 2-5 nm. The electrical properties of the nano-floating gate memory with TiSi2 and WSi2 nanocrystals were characterized by capacitance-voltage (C-V) hysteresis curve, memory speed and retention. The flat-band voltage shifts of the TiSi2 and WSi2 nanocrystals capacitors obtained appeared up to 4.23 V and 4.37 V, respectively. Their flat-band voltage shifts were maintained up to 1.6 V and 1 V after 1 hr.

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Keywords

Fabrication and Electrical Characterization of Metal-Silicide Nanocrystals for Nano Floating Gate Nonvolatile Memory

  • Seung Jong Han (a1), Ki Bong Seo (a2), Dong Uk Lee (a3), Eun Kyu Kim (a4), Se-Mam Oh (a5) and Won-Ju Cho (a6)...

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