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Fabrication and characterization of UV Schottky detectors by using a freestanding GaN substrate

Published online by Cambridge University Press:  01 February 2011

Yasuhiro Shibata
Affiliation:
Department of Electrical and Electronic Engineering, Mie University, 1515 Kamihama, Tsu, Mie 514–8507, Japan
Atsushi Motogaito
Affiliation:
Department of Electrical and Electronic Engineering, Mie University, 1515 Kamihama, Tsu, Mie 514–8507, Japan
Hideto Miyake
Affiliation:
Department of Electrical and Electronic Engineering, Mie University, 1515 Kamihama, Tsu, Mie 514–8507, Japan
Kazumasa Hiramatsu
Affiliation:
Department of Electrical and Electronic Engineering, Mie University, 1515 Kamihama, Tsu, Mie 514–8507, Japan
Youichiro Ohuchi
Affiliation:
Mitsubishi Cable Industries, LTD., Telecommunication & Photonics Research Laboratory, 4–3 Ikejiri, Itami, Hyogo 664–0027, Japan
Hiroaki Okagawa
Affiliation:
Mitsubishi Cable Industries, LTD., Telecommunication & Photonics Research Laboratory, 4–3 Ikejiri, Itami, Hyogo 664–0027, Japan
Kazuyuki Tadatomo
Affiliation:
Mitsubishi Cable Industries, LTD., Telecommunication & Photonics Research Laboratory, 4–3 Ikejiri, Itami, Hyogo 664–0027, Japan
Tatsuya Nomura
Affiliation:
Nikon Corporation, Precision Equipment Company, 1–10–1 Asamizodai, Sagamihara, Kanagawa 228–0828, Japan
Yutaka Hamamura
Affiliation:
Nikon Corporation, Precision Equipment Company, 1–10–1 Asamizodai, Sagamihara, Kanagawa 228–0828, Japan
Kazutoshi Fukui
Affiliation:
Research Center for Development of Far-Infrared Region, Fukui University, 3–9–1 Bunkyo, Fukui, Fukui 910–8507, Japan
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Abstract

GaN ultraviolet (UV) detectors were fabricated on a freestanding GaN substrate with low dislocation density. The resulting dark current density was below 1 nA/cm-2 at -8 V reverse bias, which was about 3 orders of magnitude lower than that of a similar detector made on a sapphire substrate. Moreover, the ideality factor was nearer to unity than the device on a sapphire substrate. In addition, by comparing the GaN-based device to a commonly used Si photodetector, we found that the GaN device had a lower signal-to-noise ratio and greater temperature stability. Therefore, we found a drastic reduction of dark current by using GaN freestanding substrates and so the GaN substrate produced a more effective detector than the sapphire substrate.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

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References

REFERENCES

1. Khan, M. A., Kuznia, J. N., Olson, D. T., Van Hove, J. M., Blasingame, M. and reitz, L. F.: Appl. Phys. Lett. 60, 2917 (1992).Google Scholar
2. Khan, M. A., Kuznia, J. N., Olson, D. T., Blasingame, M. and Bhattarai, A. R.: Appl. Phys. Lett. 63, 2455 (1993).Google Scholar
3. Chen, Q., Yang, J. W., Oninsky, A., Gangopadhay, S., Lim, B., Anwar, M. Z., Kahn, M. A., Kuksenkov, D. and Temkin, H.: Appl. Phys. Lett. 70, 2277 (1997).Google Scholar
4. Monroy, E., Calle, F., Munoz, E., Beaumont, B., Omnès, F. and Gibart, P.: Phys. Stat. Sol. (a) 176, 141 (1999).Google Scholar
5. Motogaito, A., Yamaguchi, M., Hiramatsu, K., Kotoh, M., Ohuchi, Y., Tadatomo, K., Hamamura, Y. and Fukui, K.: Jpn. J. Appl. Phys. 40, L368 (2001).Google Scholar
6. Motogaito, A., Ohta, K., Hiramatsu, K., Ohuchi, Y., Tadatomo, K., Hamamura, Y. and Fukui, K.: Phys. Stat. Sol. (a) 188, 337 (2001).Google Scholar
7. Miyake, H., Yasukawa, H., Kida, Y., Ohta, K., Shibata, Y., Motogaito, A., Hiramatsu, K., Ohuchi, Y., Tadatomo, K., Hamamura, Y., and Fukui, K.: Phys. Stat. Sol. (a) 200, 151 (2003)Google Scholar
8. Motogaito, A., Watanabe, H., Hiramatsu, K., Fukui, K., Hamamura, Y. and Tadatomo, K.: Phys. Stat. Sol. (a) 200, 147 (2003).Google Scholar
9. Carrano, J. C., Li, T., Grudowski, P. A., Eiting, C. J., Dupuis, R. D. and Campbell, J. C.: J. Appl. Phys. 83, 6148 (1998).Google Scholar
10. Walker, D., Saxler, A., Kung, P., Zhang, X., Hamilton, M., Diaz, J. and Razeghi, M.: Appl. Phys. Lett. 72, 3303 (1998).Google Scholar
11. Gullikson, E. M., Korbe, R., Canfield, L. R., and Vest, R. E., J. Electron. Spectrosc. Relat. Phenom. 80, 313 (1996).Google Scholar