Hostname: page-component-848d4c4894-v5vhk Total loading time: 0 Render date: 2024-06-22T08:39:32.914Z Has data issue: false hasContentIssue false
  • English
  • Français

Excitation and De-Excitation Processes in Er Implanted Light Emitting Si Devices

Published online by Cambridge University Press:  03 September 2012

G. Franzo' ,
S. Coffa  and
F. Priolo
G. Franzo'
Affiliation:
CNR - IMETEM, Stradale Primosole 50, 195121 Catania (Italy)
S. Coffa
Affiliation:
CNR - IMETEM, Stradale Primosole 50, 195121 Catania (Italy)
F. Priolo
Affiliation:
INFM and Dipartimento di Fisica dell'Universiti, Corso Italia 57, 195129 Catania (Italy)
Get access

Abstract

In this paper we show that room temperature electroluminescence at 1.54 μm can be obtained in Er and O co-doped Si diodes, fabricated by ion implantation, under both forward and reverse bias conditions. This electroluminescence is particularly strong under reverse bias at the breakdown, when Er is excited through impact with hot carriers. This last mechanism is shown to occur with a cross section of 6×10-17 cm2. The measured decay lifetime of Er ions during pumping is 100 μs at room temperature and this allows to obtain a high internal quantum efficiency. However, when the diode is shut off, the decay lifetime becomes shorter and in particular it is less than 1.2 μs (that is the time response of our system). These results can be explained by the presence of Auger nonradiative de-excitation processes that are inhibited within the depletion region during pumping and set in when, at the shut off, the Er ions are immediately embedded within the heavily doped region (∼1019/cm3) of the device. The long lifetime (100 μs) during pumping and the very fast decay time (≤ 12 μs) at the diode shut off allow us to obtain, in our diode and under reverse bias, both a high efficiency (> 10-4) and a fast modulation (≥ 80 kHz) of the 1.54 μm emission.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 438: Symposium A – Materials Modificaton and Synthesis by Ion Beam… , 1996 , 459
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Ennen, H., Pomrenke, G., Axmann, A., Eisele, K., Haydl, W., and Schneider, J., Appl. Phys. Lett. 46, 381 (1985)Google Scholar
2. Franzó, G., Priolo, F., Coffa, S., Polman, A., and Carnera, A., Appl. Phys. Lett. 64, 2235 (1994)Google Scholar
3. Zheng, B., Michel, J., Ren, F.Y.G., Kimerling, L.C., Jacobson, D.C., and Poate, J.M., Appl. Phys. Lett. 64, 2842 (1994)Google Scholar
4. Stimmer, J., Reittinger, A., Nutzel, J.F., Abstreiter, G., Holzbrecher, H., and Buchal, Ch., Appl. Phys. Lett. 68, 3290 (1996)Google Scholar
5. Coffa, S., Franzò, G., and Priolo, F., AppI. Phys. Lett. 69, 2077 (1996)Google Scholar
6. Adler, D.L., Jacobson, D.C., Eaglesham, D.J., Marcus, M.A., Benton, J.L., Poate, J.M., and Citrin, P.H., Appl. Phys. Lett. 61, 2181 (1992)Google Scholar
7. Coffa, S., Franzò, G., Priolo, F., Polman, A., and Serna, R., Phys. Rev. B 49, 16313 (1994)Google Scholar
8. Priolo, F., Franzò, G., Coffa, S., Polman, A., Libertino, S., Barklie, R., and Carey, D., J. Appl. Phys. 78, 3874 (1995)Google Scholar
9. Franzò, G., Coffa, S., Priolo, F., and Spinella, C., J. Appl. Phys. (in press, 1st March 1997 issue)Google Scholar
10. Chynoweth, A.G. and McKay, M.G., Phys. Rev. 106, 418 (1957)Google Scholar
11. Pankove, J.I. and Feuerstain, R.J., Mat. Res. Soc. Symp. Proc. 301, 287 (1993)Google Scholar