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Evaluation of (In,Ga)N Films as Optical Absorption Filters for Application in Integrated Fluorescence Detection Micro-Bioanalytical Systems

Published online by Cambridge University Press:  21 March 2011

J. Alex Chediak
Affiliation:
Department of Materials Science and Engineering, University of California, Berkeley Berkeley, CA 94720-1760
Michael Kneissl
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Road, Palo Alto, CA, 94304
Timothy D. Sands
Affiliation:
Department of Materials Science and Engineering, University of California, Berkeley Berkeley, CA 94720-1760
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Abstract

Fluorescence detection in integrated micro-bioanalytical systems requires the selective exclusion of light from the excitation source (typically blue or UV) and transmission of the longer wavelength fluorescence signal. In the present research, the application of (In,Ga)N alloy thin films as optical filters for absorption of blue (470 nm) and transmission of green (530 nm) has been evaluated. Absorption spectra, photoluminescence (PL) and Rutherford backscattering spectroscopy (RBS) results are presented for 200-400 nm (In,Ga)N thin films grown by MOCVD on sapphire substrates with 2-4 μm GaN buffer layers. A sigmoidal function was used to model the absorption coefficient of (In,Ga)N as a function of energy, Eg, and the broadening (ΔE) associated with the Urbach tail. Experimental data showed that, as expected, the absorption band edge for (In,Ga)N films broadened with increasing InN mole%. An increase in ΔE of 35 meV was observed when the InN mole% was increased from 10 to 16%. The sigmoidal function model provided a good fit to the experimental data, which allowed the experimental data to be extrapolated to higher InN concentrations. Based on this analysis, it is predicted that a 5 μm thick In0.22Ga0.78N film should transmit 50% of green light (530 nm) and only 3.29 x 1 0-4 of blue light (470 nm). The (In,Ga)N films that have been evaluated range in InN mole% from ~2-16%. The higher InN mole% samples (10-16%) can successfully filter lower wavelengths (e.g., 400 nm). For a filter application, it is also important that photoluminescence be effectively suppressed. In MQW structures, high PL intensity is often obtained by means of InN segregation (InN-rich nanoclusters). But for our evaluation with 200-400 nm (In,Ga)N films, relaxation of coherency strain results in large densities of dislocations, and correspondingly low PL intensity.

Type
Research Article
Copyright
Copyright © Materials Research Society 2002

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Footnotes

*

Electronic mail for correspondence: chediak@uclink.berkeley.edu

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