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Evaluation of Ferroelectricity in MFIS Type Capacitor Using Pulsed C-V Measurements

  • Norifumi Fujimura (a1), Takeshi Yoshimura (a1) and Taichiro Ito (a1)

Abstract

We have been proposing YMnO3 with low remanent polarization and dielectric permittivity as a transistor type FeRAM. Conventional C-V measurements are normally used to evaluate the ferroelectricity of ferroelectric thin films on Si substrates. For ferroelectric thin films with low polarization, however, there are some issues to understand the C-V hysteresis. For example, interfacial polarization and space charge affect the C-V hysteresis. The effect of interfacial polarization on C-V behavior was calculated assuming the connection of ferroelectric and dielectric layers with different resistivity. If a ferroelectric layer with a leakage current of 1×10-6 A/cm2 is connected to the dielectric layer with a leakage current of 1×10-9 A/cm2, a charge density of 10-9 C/cm2 should be generated in the period of 0.2 sec. Space charge should have a longer time constant for accumulating the charge. Pulsed C-V measurement must be effective to avoid these issues. This paper proposes a simple method to evaluate the real component of ferroelectricity in the C-V hysteresis using YMnO3 or ZnO:Li with very low remanent polarization.

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Evaluation of Ferroelectricity in MFIS Type Capacitor Using Pulsed C-V Measurements

  • Norifumi Fujimura (a1), Takeshi Yoshimura (a1) and Taichiro Ito (a1)

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