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Epitaxial Growth of Oxide Thin Films on (001) Metal Surfaces Using Pulsed-Laser Deposition

Published online by Cambridge University Press:  15 February 2011

D. P. Norton
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, TN 37831–6056
C. Park
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, TN 37831–6056
B. Saffian
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, TN 37831–6056
J. D. Budai
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, TN 37831–6056
A. Goyal
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, TN 37831–6056
D. K. Christen
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, TN 37831–6056
D. M. Kroeger
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, TN 37831–6056
D. Lee
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, TN 37831–6056
Q. He
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, TN 37831–6056
M. Paranthaman
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, TN 37831–6056
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Abstract

The epitaxial growth of CeO2 on various (001) metal surfaces using pulsed-laser deposition is discussed. In particular, the growth of (001) CeO2 on (001) Pd, Ag, and Ni is described. Emphasis is given to the specific deposition conditions which successfully alleviate the formation ornative oxides at the metal/metal oxide interface. The control of the epitaxial relationships between the oriented oxides films and the underlying noble and oxidizing metal surfaces is addressed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

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