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Energy-Filtered Transmission Electron Microscopy of Multilayers in Semiconductors
Published online by Cambridge University Press: 10 February 2011
Abstract
Knowledge about compositional profiles on an atomic scale is important for semiconductor multilayers. In this paper, we attempt to quantify the Ti atomic fraction in a TixAll–xN multilayer and the total As concentrations in As δ-doped layers using energy-filtered imaging. These two materials represent materials where the characteristic energy loss edges are located in widely different energy losses with the L edge of Ti being above 450eV and that of As around 1350eV. The accuracy of the Ti atomic fraction in TixAll–xN is found to be around 10at% for specimens of uniform thickness made by focused ion beam milling, whereas the resolution and As concentration for the As containing δ-layer is found to be dominated by the signal to noise ratio.
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- Copyright © Materials Research Society 1998
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