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Electron Optical Characterization of Amorphous SIC:H CVD Films
Published online by Cambridge University Press: 25 February 2011
Abstract
The utility of various electron optical methods to characterize the microstructure and composition of thin films of amorphous silicon-carbon films formed by plasma-activated CVD of SiH4 and CH4 has been investigated. The techniques employed include conventional and high resolution transmission electron microscopy and diffraction, non-dispersive x-ray spectroscopy and electron energy loss spectroscopy.
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