Hostname: page-component-8448b6f56d-m8qmq Total loading time: 0 Render date: 2024-04-24T06:39:53.785Z Has data issue: false hasContentIssue false

Electrochemical Corrosion Inhibition System for Photoresist Stripper for New Copper FPD Manufacturing

Published online by Cambridge University Press:  01 February 2011

Seiji Inaoka
Affiliation:
seiji.inaoka@tycohealthcare.com, Tyco Healthcare, Mallinckrodt Baker, 1904 JT Baker Way, Bldg 122, Phillipsburg, NJ, 08865, United States
Sang In Kim
Affiliation:
si.kim@tycohealth.co.kr, Tyco Healthcare, Mallinckrodt Baker, Pyeongtaek, N/A, Korea, Republic of
Get access

Abstract

Development of photoresist stripper with copper compatibility is challenging as conventional corrosion inhibitors do not protect the metal as expected. Copper corrosion inhibition mechanism of newly developed photoresist stripper is proposed that significantly reduces copper corrosion with small amount of corrosion inhibitor.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 Ives, D. J. G. and Rawson, A. E., “Copper Corrosion III. Electrochemical Theory of General Corrosion”, J. Electrochem. Soc. pp. 458462, Vol. 109, No. 6 (1962).Google Scholar
2 Zoubov, N. de, Vanleugenhaghe, C., and Pourbaix, M., “Copper” in Atlas of Electrochemical Equalibria in Aqueous Media, NACE Cebelcor, pp. 384392 (1974).Google Scholar
3The solution with only Component B showed etch rate of 280å/min at 70°C.Google Scholar
4 Hackerman, N., Snavely,|Jr., E. S. and Payne, J. S. Jr, “Effects of Anions on Corrosion Inhibition by Organic Compounds, J. Electrochem. Soc. pp. 677681, Vol. 113, No. 7 (1966).Google Scholar