Hostname: page-component-76fb5796d-25wd4 Total loading time: 0 Render date: 2024-04-26T10:41:24.860Z Has data issue: false hasContentIssue false
  • English
  • Français

Electric Field Direct Force in Electromigration Mechanism

Published online by Cambridge University Press:  10 February 2011

A.A. Karpushin ,
A.N. Sorokin ,
M.R. Baklanov  and
K. Maex
A.A. Karpushin
Affiliation:
Institute of Semiconductor Physics SB RAS, 630090 Novosibirsk, Russia
A.N. Sorokin
Affiliation:
Institute of Semiconductor Physics SB RAS, 630090 Novosibirsk, Russia
M.R. Baklanov
Affiliation:
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
K. Maex
Affiliation:
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
Get access

Abstract

The direct influence of the applied electric field on ions of lattice, as a whole, was considered. This influence induces the strains and stresses and its gradients. In turn, this additional stresses may induce the vacancy (ion) diffusion flux. It is shown that this flux coincides in the direction and is comparable in magnitude with the electromigration flux induced by the electron wind.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 516: Symposium E – Low Dielectric Constant Materials IV , January 1998 , 195
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Fix, V.B., Fizika tverdogo tela, 1,16; 1 1321(1959), (in rus.);Google Scholar
Lifshitz, I.M., Kaganov, M.I., Fix, V.B., Fizika tverdogo tela, 6, 2723(1961), (in rus.)Google Scholar
2. Huntington, H.B., Grone, A.R., J. Phys. Chem. Solids, 20, 76 (1961)10.1016/0022-3697(61)90138-XGoogle Scholar
3. Bosvieux, C., Friedel, J., J. Phys. Chem. Solids, 23, 123 (1962)10.1016/0022-3697(62)90066-5Google Scholar
4. Landauer, R., Phys. Rev.,14, 1474 (1976)10.1103/PhysRevB.14.1474Google Scholar
5. Sorbello, R.S., J. Phys. Chem. Solids, 34, 937 (1973)10.1016/S0022-3697(73)80002-2Google Scholar
6. Kohn, W., Lattinger, J.M., Phys. Rev., 108, 590 (1957)10.1103/PhysRev.108.590Google Scholar
7. Baskin, E.M., Entin, å.V., Phys. Low-Dim. Struct., 1/2, 17 (1997)Google Scholar
8. d'Heurle, F. and Ho, P.S., Thin Films: Interdifusion and Reactions, edited by Poate, J., Tu, K.N., and Mayrs, J., (John Wiley, Ney-York, 1978), ch 8.Google Scholar
9. Landau, L.D., Lifshitz, E.M.. Theory of elasticity, (Nauka, Moscow, 1987) p. 33 Google Scholar
10. Penney, R.V., J. Phys. Chem. Solids, 25, 3355 (1964)10.1016/0022-3697(64)90112-XGoogle Scholar
11. Blech, I.A., J. Appl. Phys, 47, 1203 (1976)10.1063/1.322842Google Scholar
12. Blech, I.A., Herring, C., Appl. Phys. Lett., 29, 131 (1976)10.1063/1.89024Google Scholar