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Effects of Aluminum Implantation on the Oxidation Behavior of Silicon Nitride in a Sodium Nitrate-Oxygen Gas Mixture

Published online by Cambridge University Press:  03 September 2012

Y. Cheong
Affiliation:
Department of Materials Science and Engineering, Stevens Institute of Technology, Hoboken, NJ 07030
H. Du
Affiliation:
Department of Materials Science and Engineering, Stevens Institute of Technology, Hoboken, NJ 07030
S. P. Withrow
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37830
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Abstract

The role of aluminum in negating the adverse effect of alkali species on the oxidation resistance of Si3N4 ceramics was investigated by exposing unimplanted and aluminum-implanted (1 and 5 at.%) Si3N4 samples to a sodium nitrate (95 ppm)-dry oxygen gas mixture at 1. atm and at 900°1100°C. Oxidation of unimplanted Si3N4 was rapid and linear with an activation energy of 57 kJ/mol. In contrast, samples implanted with aluminum exhibited a considerably reduced oxide growth which was parabolic in nature with activation energies of 103–112 kJ/mol. The morphological characteristics of the oxide layer also showed marked improvement as the aluminum concentration increased.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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References

1. Jacobson, N.S., J. Am. Ceram. 76, p. 3 (1993).Google Scholar
2. Pickrell, G.R., Sun, T., and Brown, J.J. JR., Fuel Processing Technology, 44, p. 213 (1995).Google Scholar
3. Zheng, Z., Tressler, R.E., and Spear, K.E., Corrosion Science. 33, p. 569 (1992).Google Scholar
4. Mcnallan, M.J., Hsu, P.P., and Lee, S.Y., JOM, p. 22–25, December (1993).Google Scholar
5. Jacobson, N.S., J.Am.Ceram. 31. p. 91 (1989).Google Scholar
6. Kingery, W.D., Bowen, H.K., and Uhlmann, D.R., Introduction to Ceramics, 2nd ed., John Willey & Sons, New York, NY (1976).Google Scholar
7. Rawson, H., Properties and Applications of Glass, Glass Science and Technology 3, Elsevier Scientific Publishing Co., Inc, Amsterdam, The Netherlands (1980).Google Scholar
8. Profile codes, Implant Sciences Corp., Danvers, MA, USA.Google Scholar
9. Du, H., Libera, M., Yang, Z., Lai, P.J., Jacobson, D. C., Wang, Y.C. and Davis, R.F., Appl. Phys. Lett., 62, p. 423 (1993).Google Scholar
10. Backhaus-Ricoult, M. and Gogotsi, Y.G., J. Mater. Res., 10, p. 2306 (1995).Google Scholar
11. Deal, B.E. and Grove, A.S., J. Appl. Phys., 36, p. 3770 (1965).Google Scholar
12. Jean, J.H. and Gupta, T. K., J. Mater. Res., 10, p. 1312 (1995).Google Scholar