Hostname: page-component-7bb8b95d7b-s9k8s Total loading time: 0 Render date: 2024-09-18T19:06:31.194Z Has data issue: false hasContentIssue false

Effect of Heavy Doping on the Photoluminescence and Photoreflectance Spectra of Silicon and SiGe Layers.

Published online by Cambridge University Press:  15 February 2011

C. Bru-Chevallier
Affiliation:
LPM (URA CNRS) INSA Bât.502, 69621 Villeurbanne Cedex, FRANCE, bru@insa.insalyon. fr
B. Trui
Affiliation:
LPM (URA CNRS) INSA Bât.502, 69621 Villeurbanne Cedex, FRANCE, bru@insa.insalyon. fr
A. Souifi
Affiliation:
LPM (URA CNRS) INSA Bât.502, 69621 Villeurbanne Cedex, FRANCE, bru@insa.insalyon. fr
G. Brémond
Affiliation:
LPM (URA CNRS) INSA Bât.502, 69621 Villeurbanne Cedex, FRANCE, bru@insa.insalyon. fr
G. Guillot
Affiliation:
LPM (URA CNRS) INSA Bât.502, 69621 Villeurbanne Cedex, FRANCE, bru@insa.insalyon. fr
J. A. Chroboczek
Affiliation:
France Telecom CNET-CNS, BP98, 38243 Meylan, FRANCE
Get access

Abstract

PL and PR measurements have been performed on a set of silicon samples p-type doped between 1018 cm−3 and 1020 cm−3. Both optical methods are shown to be complementary as the bandgap narrowing effect is clearly evidenced from PL results, whereas low temperature PR results rather show the filling effect of the valence band, in good agreement with theoretical determinations. We observe an increase of E′0 transition as p-type doping level is increased.

PR spectra of Si and SiGe alloys at low temperature are presented together with theoretical fitting using the third derivative functional form of the unperturbed dielectric function of both direct optical transitions involved in the main PR feature : E′0 and E1.

This characterisation work will be discussed by pointing out that PL and PR results are closely connected, allowing the measurement of the effect of heavy doping on the Si and SiGe band structures.This study is fully relevant to high speed bipolar transistor development.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Sugii, T., Yamazaki, T., Ito, T., Electronics Letters, 25, p60 (1989)Google Scholar
2. Kamins, T.I., Nauka, K., Kruger, J.B., Holt, J.L., King, C.A., Noble, D.B., Gronet, C.M., Gibons, J.F., IEEE El. Dev. Letters 10, p503 (1989)Google Scholar
3. Mieghem, P. Van, Reviews of Modern Physics, 64, p755, (1992)Google Scholar
4. Wagner, J., Alamo, J.A. del, J. App. Phys., 63, p425, (1988)Google Scholar
5. Souifi, A., Brémond, G., Benyattou, T., Guillot, G., Dutartre, D., Warren, P., Appl. Phys. Lett. 62, p2986 (1993)Google Scholar
6. Dutartre, D., Warren, P., Berbezier, L., Perret, P., Thin Solid Films, 222, p56, (1992)Google Scholar
7. Pollak, F.H., Handbook of Semiconductors. Ed. Balkanski, M., New YorkAcademic Press, pp527635 (1994)Google Scholar
8. Bru, C., Benyattou, T., Baltagi, Y., Monéger, S., Guillot, G., Proceedings SOTAPOCS XVIII, Honolulu May 1993, Ed. Enstrom, R.E., Jour. Electroch. Soc. 93–27, p214 (1993)Google Scholar
9. Dutartre, D., Brémond, G., Souifi, A., Benyattou, T., Phys. Rev. B, 44, p 11525 (1991)Google Scholar
10. Aspnes, D.E. p.109 in Handbook on Semiconductors, N. Holland NY (1980)Google Scholar
11. Seraphin, B.O., Bottka, N., Phys. Rev. B, 145, p 145 (1966)Google Scholar
12. Yin, Y., Qiang, H., Pollak, F.H., Streit, D.C., Wojtowicz, M., Appl. Phys. Lett. 61, p1579 (1992)Google Scholar
13. Fu, Y., Jain, S.C., Willander, M., Loferski, J.J., J. Appl. Phys. 74, p402, (1993)Google Scholar
14. Yin, Y., Pollak, F.H., Dutartre, D., Pantel, R., Chroboczek, J.A., Thin Solid Films 222, p85 (1992)Google Scholar