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The Effect of Dopant Concentration on the Native Oxide Growth on Silicon Wafer Surface

  • Y. Ishimaru (a1), M. Yoshiki (a1) and T. Hatanaka (a1)

Abstract

The effects of dopant type and dopant concentration on the native oxide growth in air on the silicon surface were investigated. The oxide thickness was measured by X-ray photoelectron spectrometry (XPS). The oxide was thicker on n-type Si than on p-type Si in early oxidation. The oxide increased linearly with the dopant concentration. This enhancement of oxidation was assumed to be caused by vacancies near the surface in the silicon bulk.

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The Effect of Dopant Concentration on the Native Oxide Growth on Silicon Wafer Surface

  • Y. Ishimaru (a1), M. Yoshiki (a1) and T. Hatanaka (a1)

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